Inventor
Jan Cornelis Van Der Hoeven
Inventor
Veldhoven, NL
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
B82YSpecific uses or applications of nanostructures5%
G01DMeasuring not specially adapted for a specific variable5%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure5%
G01RMeasuring electric variables5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
G05GControl devices or systems insofar as characterised by mechanical features only5%
G11BInformation storage based on relative movement between record carrier and transducer5%
H01FMagnets5%
H03KPulse technique5%
PatentTitleYear
10,509,326Lithographic apparatus and device manufacturing method201910,061,207Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus20189,703,210'Lithographic apparatus and device manufacturing method'20178,941,811'Lithographic apparatus and device manufacturing method'20158,780,321'Lithographic apparatus and device manufacturing method'20148,638,419'Lithographic apparatus and device manufacturing method'20148,514,365'Lithographic apparatus and device manufacturing method'20138,125,610'Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus'20128,115,899'Lithographic apparatus and device manufacturing method'20127,880,860'Lithographic apparatus and device manufacturing method'20117,705,586'Magnetic sensor for input devices'20107,656,502'Lithographic apparatus and device manufacturing method'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2019Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2010–2019Based in Veldhoven, NL· patent location history
2012–2015Patents assigned to VAN DER HOEVEN JAN CORNELIS (6)· patent assignee history
2012–2015Patents assigned to STAVENGA MARCO KOERT (4)· patent assignee history
2012–2015Patents assigned to BASELMANS JOHANNES JACOBUS MATHEUS (3)· patent assignee history
2012–2015Patents assigned to DONDERS SJOERD NICOLAAS LAMBERTUS (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 10 | 2010–2019 |
| VAN DER HOEVEN JAN CORNELISself | 6 | 2012–2015 |
| STAVENGA MARCO KOERT | 4 | 2012–2015 |
| BASELMANS JOHANNES JACOBUS MATHEUS | 3 | 2012–2015 |
| DONDERS SJOERD NICOLAAS LAMBERTUS | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 12 | 2010–2019 |