Inventor
Tetsuya Ishikawa
Inventor
Santa Clara, CA, US
Overview
Patents· 224 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
C23CCoating metallic material10%
H01JElectric discharge tubes or discharge lamps7%
B41JTypewriters6%
Y10TTechnical subjects covered by former us classification6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
B60NSeats specially adapted for vehicles3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
G03GElectrography3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
PatentTitleYear
10,833,230Wavelength converting member and light emitting device202010,804,442Light emitting device202010,775,357Gas sensor202010,751,887Link mechanism202010,723,153Inkjet printing apparatus202010,642,554Control apparatus for assigning a print job, image forming apparatus, image forming system, and program202010,637,093Thin film battery structures having sloped cell sidewalls202010,622,521Light-emitting device202010,610,442Massage device202010,608,149Wavelength converting member and light emitting device202010,576,012Massaging apparatus202010,553,568Light emitting device202010,534,305Image forming apparatus and non-transitory recording medium storing computer readable program202010,481,537Image forming apparatus and control program for removing carriers on a photoreceptor201910,458,947Thinning detection system and thinning detection method201910,426,693Massage machine201910,406,838Inkjet printing apparatus201910,330,337Outdoor unit201910,274,865Developing device and image forming apparatus201910,243,107Light emitting device and method for manufacturing thereof201910,222,727Image forming apparatus which supplies complementing toner to a region between formed toner images in which no toner is provided, and non-transitory computer-readable recording medium storing image forming program201910,203,632Developing device and image forming apparatus201910,198,663System for predicting occurrence of defective image and program for predicting occurrence of defective image201910,189,386Seat belt cover201910,183,596Vehicle seat201910,183,647Vehicle seatbelt buckle assembly and method201910,137,578Joint structure, hand device, robot arm and robot201810,115,994Devices and methods for reducing battery defects201810,020,532Thin film battery structures having sloped cell sidewalls201810,012,182Fuel vapor processing apparatus201810,005,376Vehicle seat20189,987,756Hand device, robot arm, and robot20189,919,623'Towel bar for motor vehicle seat'20189,919,620'Removable seat for a motor vehicle'20189,884,952'Conveyor belt rubber composition and conveyor belt'20189,864,908'Slow change detection system'20189,855,865'Grip mechanism for a motor vehicle seat'20189,855,861'Lateral slide removable seat'20189,855,872'Garnish cap including living hinge for a vehicle seat'20189,855,862'Spacer for lateral slide removable seat'20189,849,808End bracket for lateral slide rail for removable seat20179,796,555'Image forming apparatus and image formation system'20179,714,433'Human pluripotent stem cells induced from undifferentiated stem cells derived from a human postnatal tissue'20179,713,970'Handle for a vehicle seat'20179,715,196'Method of controlling image forming apparatus, image forming apparatus and image forming system to identify paper position and paper deformation'20179,696,664'Image forming apparatus, image formation system and recording medium'20179,696,680'Transfer-section contamination prevention device and image forming apparatus'20179,625,725'Wearable computer'20179,544,983'Apparatus for and method of supplying target material'20179,544,982'Nozzle'20179,500,619'Method for performing processing on gas sensor'20169,436,143'Fixing apparatus, image forming apparatus and temperature control method of fixing apparatus'20169,431,477'Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)'20169,415,960'Printing apparatus and printing method'20169,272,642'Vehicle seat'20169,229,047'Method for manufacturing sensor element for use in gas sensor, inspecting electrical characteristics of sensor element, and pre-treating sensor element'20169,173,804'Lower-leg massage device'20159,164,415'Image forming apparatus and method of forming an image which can prevent a development memory from occurring'20159,107,508'Chair-type massage apparatus'20159,113,017'Operation control method, image processing apparatus and non-transitory computer-readable storage medium'20159,004,640'Printing apparatus'20158,876,280'Printing apparatus'20148,845,026'Vehicle seat'20148,833,811'Trunk locking system'20148,795,491'Method of processing sensor element and sensor element'2014RE045063'Apparatus and method for controlling recording and sheet conveying based on recording scans and sheet position'2014RE044938'Apparatus and method for controlling recording and sheet conveying based on recording scans and sheet position'20148,690,239'Chair-type massage apparatus'20148,664,815'Flywheel energy storage device with a hubless ring-shaped rotor'20148,651,638'Inkjet printing apparatus'20148,602,538'Inkjet printing apparatus'20138,568,529'HVPE chamber hardware'20138,550,031'Cluster tool architecture for processing a substrate'20138,523,306'Liquid supply device and printing apparatus including the same'20138,507,304'Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)'20138,491,720'HVPE precursor source hardware'20138,480,212'Printing apparatus'20138,465,210'Rolling bearing unit for wheel'20138,449,950'In-situ deposition of battery active lithium materials by plasma spraying'20138,424,410'Link mechanism'20138,399,065'In-situ deposition of battery active lithium materials by thermal spraying'20138,348,401'Inkjet printing apparatus'20138,279,577'Substrate support having fluid channel'20128,267,698'Connector unit with a clicking feeling'20128,235,610'Printing apparatus and conveyance control method'2012D0664172'Dome assembly for a deposition chamber'20128,216,379'Non-circular substrate holders'20128,215,262'Cluster tool architecture for processing a substrate'20128,211,697'Induced pluripotent stem cells produced using reprogramming factors and a rho kinase inhibitor or a histone deacetylase inhibitor'20128,191,900'Oil seal'20128,181,596'Cluster tool architecture for processing a substrate'20128,183,132'Methods for fabricating group III nitride structures with a cluster tool'20128,146,530'Cluster tool architecture for processing a substrate'20128,140,836'Information processing apparatus and program'20128,138,069'Substrate pretreatment for subsequent high temperature group III depositions'20128,107,116'Image forming apparatus'20128,078,863'Information processing apparatus and program'20118,060,781'Data processing apparatus and program'20118,047,013'Outdoor unit of air conditioner'20118,047,724'Bearing device for wheel'2011D0642605'Lid assembly for a substrate processing chamber'20117,955,986'Capacitively coupled plasma reactor with magnetic plasma control'20117,951,099'Massage device'20117,953,967'Information processing apparatus and program'20117,926,895'Printing apparatus and conveyance control method'20117,926,905'Ink jet recording apparatus'20117,925,377'Cluster tool architecture for processing a substrate'20117,866,789'Inkjet printing apparatus and method of controlling an ink suction pump motor'20117,861,040'Memory apparatus, cache control method, and cache control program'20107,811,015'Printing apparatus and conveyance control method'20107,793,939'Sealing structure of wheel supporting device'20107,768,765'Substrate support having heat transfer system'20107,764,389'Apparatus and method for controlling recording and sheet conveying based on recording scans and sheet position'20107,743,728'Cluster tool architecture for processing a substrate'20107,707,376'Verifying the validity of data saved at power down by comparing the time of save to time of power-off upon start up'20107,699,021'Cluster tool substrate throughput optimization'20107,694,647'Cluster tool architecture for processing a substrate'20107,692,819'Image processing method and image processing apparatus'20107,635,166'Controller for seat locking device'20097,630,586'Image processing apparatus and image processing system'2009D0604250'Electrical connector'20097,614,795'Rolling bearing assembly'2009D0603801'Electrical connector'20097,613,895'Memory administrating method'20097,560,377'Plasma processes for depositing low dielectric constant films'20097,517,469'Method and system to measure flow velocity and volume'20097,508,538'Image data rotation apparatus'20097,453,592'Image processing system'20087,413,627'Deposition chamber and method for depositing low dielectric constant films'20087,396,105'Ink jet recording apparatus'20087,396,412'Coat/develop module with shared dispense'20087,366,458'Image forming apparatus'20087,357,842'Cluster tool architecture for processing a substrate'20087,354,501'Upper chamber for high density plasma CVD'20087,311,684'Massage device'20077,294,224'Magnet assembly for plasma containment'20077,288,746'Integrated thermal unit having laterally adjacent bake and chill plates on different planes'20077,274,005'Bake plate having engageable thermal mass'20077,255,747'Coat/develop module with independent stations'20077,223,323'Multi-chemistry plating system'20077,221,553'Substrate support having heat transfer system'20077,074,298'High density plasma CVD chamber'20067,036,453'Apparatus for reducing plasma charge damage for plasma processes'20067,014,291'Ink jet recording apparatus'20066,958,098'Semiconductor wafer support lift-pin assembly'20056,929,700'Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD'20056,930,061'Plasma processes for depositing low dielectric constant films'20056,898,065'Method and apparatus for operating an electrostatic chuck in a semiconductor substrate processing system'20056,869,896'Plasma processes for depositing low dielectric constant films'20056,853,141'Capacitively coupled plasma reactor with magnetic plasma control'2005D0501448'Electrical connector'20056,833,052'Deposition chamber and method for depositing low dielectric constant films'20046,814,814'Cleaning residues from surfaces in a chamber by sputtering sacrificial substrates'20046,776,875'Semiconductor substrate support assembly having lobed o-rings therein'20046,768,878'Image forming method and image forming apparatus utilizing a control patch'20046,759,624'Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber'20046,734,115'Plasma processes for depositing low dielectric constant films'20046,722,761'Inkjet recording head and inkjet recording device'20046,709,218'Robot blade for semiconductor processing equipment'20046,667,527'Temperature sensor with shell'20036,660,656'Plasma processes for depositing low dielectric constant films'20036,660,662'Method of reducing plasma charge damage for plasma processes'20036,656,286'Pedestal with a thermally controlled platen'20036,639,962'Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel'20036,596,655'Plasma processes for depositing low dielectric constant films'20036,596,653'Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD'20036,589,610'Deposition chamber and method for depositing low dielectric constant films'20036,572,708'Semiconductor wafer support lift-pin assembly'20036,562,690'Plasma processes for depositing low dielectric constant films'20036,545,420'Plasma reactor using inductive RF coupling, and processes'20036,541,282'Plasma processes for depositing low dielectric constant films'20036,523,563'Modular gas panel closet for a semiconductor wafer processing platform'20036,519,991'Water jet peening apparatus'20036,518,195'Plasma reactor using inductive RF coupling, and processes'20036,517,634'Chemical vapor deposition chamber lid assembly'20036,511,153'Preliminary discharge acceptor mechanism and printing apparatus provided with the preliminary discharge acceptor mechanism'20036,488,807'Magnetic confinement in a plasma reactor having an RF bias electrode'20026,486,081'Gas distribution system for a CVD processing chamber'20026,447,651'High-permeability magnetic shield for improved process uniformity in nonmagnetized plasma process chambers'20026,425,276'Water jet peening apparatus'20026,416,823'Deposition chamber and method for depositing low dielectric constant films'20026,383,954'Process gas distribution for forming stable fluorine-doped silicate glass and other films'20026,363,624'Apparatus for cleaning a semiconductor process chamber'20026,348,725'Plasma processes for depositing low dielectric constant films'20026,345,083'Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel'20026,341,151'Preventive maintenance method and apparatus of a structural member in a reactor pressure vessel'20026,303,523'Plasma processes for depositing low dielectric constant films'20016,286,451'Dome: shape and temperature controlled surfaces'20016,260,943'Ink-jet printing apparatus with multi-position cap'20016,251,187'Gas distribution in deposition chambers'20016,251,792'Plasma etch processes'20016,246,484'Image reading apparatus and information processing apparatus having image reading function'20016,239,553'RF plasma source for material processing'20016,214,121'Pedestal with a thermally controlled platen'20016,192,829'Antenna coil assemblies for substrate processing chambers'20016,189,483'Process kit'20016,182,602'Inductively coupled HDP-CVD reactor'20016,170,428'Symmetric tunable inductively coupled HDP-CVD reactor'20016,143,078'Gas distribution system for a CVD processing chamber'20006,083,344'Multi-zone RF inductively coupled source configuration'20006,070,551'Deposition chamber and method for depositing low dielectric constant films'20006,068,784'Process used in an RF coupled plasma reactor'20006,062,670'Ink jet recording apparatus having discharge recovery means'20006,015,591'Deposition method'20005,997,120'Recording apparatus which allows ink amount detection upon exchange of a printhead'19995,992,961'Ink jet recording apparatus, method for determining reduced ink remains, and information processing apparatus'19995,971,525'Recording apparatus having a deelectrifying member for a recording head'19995,944,902'Plasma source for HDP-CVD chamber'19995,933,174'Ink refilling system, and ink refilling apparatus and ink refilling method usable in ink refilling system'19995,903,287'Ink jet recording apparatus with simplified suction recovery device'19995,886,729'Sheet supplying apparatus using a flexible elastic pawl member for separating sheets one by one'19995,876,119'In-situ substrate temperature measurement scheme in plasma reactor'19995,824,607'Plasma confinement for an inductively coupled plasma reactor'19985,818,471'Recording apparatus and method for indicating decrease of ink remains'19985,816,723'Electronic apparatus capable of feeding sheets from a front side, and sheet feeding device for use therewith'19985,800,621'Plasma source for HDP-CVD chamber'19985,772,771'Deposition chamber for improved deposition thickness uniformity'19985,761,023'Substrate support with pressure zones having reduced contact area and temperature feedback'19985,583,737'Electrostatic chuck usable in high density plasma'19965,572,105'Stepping motor control method including varying the number of split sections in one step drive period of a stepping motor'19965,556,501'Silicon scavenger in an inductively coupled RF plasma reactor'19965,539,609'Electrostatic chuck usable in high density plasma'19965,350,479'Electrostatic chuck for high power plasma processing'19945,308,417'Uniformity for magnetically enhanced plasma chambers'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2016Patents assigned to APPLIED MATERIALS INC (86)· patent assignee history
1996–2020Patents assigned to CANON KK (34)· patent assignee history
1996–2020Based in Yokohama, JP· patent location history
1998–2009Based in Santa Clara, CA, US· patent location history
2003–2016Based in Saratoga, CA, US· patent location history
2004–2017Based in Hachioji, JP· patent location history
2009–2020Patents assigned to HONDA MOTOR CO LTD (19)· patent assignee history
2011–2016Patents assigned to ISHIKAWA TETSUYA (38)· patent assignee history
2015–2020Patents assigned to KONICA MINOLTA INC (15)· patent assignee history
2017–2019Based in Dublin, OH, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 86 | 1994–2016 |
| ISHIKAWA TETSUYAself | 38 | 2011–2016 |
| CANON KK | 34 | 1996–2020 |
| HONDA MOTOR CO LTD | 19 | 2009–2020 |
| KONICA MINOLTA INC | 15 | 2015–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 49 | 1998–2009 |
| Saratoga, California, US | 36 | 2003–2016 |
| Yokohama, JP | 33 | 1996–2020 |
| Hachioji, JP | 14 | 2004–2017 |
| Dublin, OH, US | 11 | 2017–2019 |