Inventor
Bjorn Brauer
Inventor
Beaverton, OR, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Tprimary
G06TImage data processing or generation, in general22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G06FElectric digital data processing10%
G06KGraphical data reading9%
G06VImage or video recognition or understanding9%
H01LSemiconductor devices5%
G06NComputing arrangements based on specific computational models3%
G05BControl or regulating systems in general2%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
11,120,546Unsupervised learning-based reference selection for enhanced defect inspection sensitivity202111,113,827Pattern-to-design alignment for one-dimensional unique structures202111,049,745Defect-location determination using correction loop for pixel alignment202111,010,885Optical-mode selection for multi-mode semiconductor inspection202110,964,016Combining simulation and optical microscopy to determine inspection mode202110,957,035Defect classification by fitting optical signals to a point-spread function202110,922,808File selection for test image to design alignment202110,818,005Previous layer nuisance reduction through oblique illumination202010,801,968Algorithm selector based on image frames202010,713,534Training a learning based defect classifier202010,698,325Performance monitoring of design-based alignment202010,648,925Repeater defect detection202010,620,135Identifying a source of nuisance defects on a wafer202010,600,175Dynamic care areas for defect detection202010,600,177Nuisance reduction using location-based attributes202010,557,802Capture of repeater defects on a semiconductor wafer202010,535,131Systems and methods for region-adaptive defect detection202010,504,213Wafer noise reduction by image subtraction across layers201910,402,688Data augmentation for convolutional neural network-based defect inspection201910,395,358High sensitivity repeater defect detection201910,360,477Accelerating semiconductor-related computations using learning based models201910,360,671Tool health monitoring and matching201910,192,302Combined patch and design-based defect detection201910,186,028Defect signal to noise enhancement by reducing die to die process noise201910,151,706Inspection for specimens with extensive die to die process variation201810,127,651Defect sensitivity of semiconductor wafer inspectors using design data with wafer image data201810,115,040Convolutional neural network-based mode selection and defect classification for image fusion20189,702,827'Optical mode analysis with design-based care areas'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2021Patents assigned to KLA TENCOR CORP (25)· patent assignee history
2017–2021Based in Beaverton, OR, US· patent location history
2020–2021Patents assigned to KLA—TENCOR CORP (2)· patent assignee history
2021Patents assigned to KLA CORP (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 25 | 2017–2021 |
| KLA CORP | 6 | 2021 |
| KLA—TENCOR CORP | 2 | 2020–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beaverton, OR, US | 28 | 2017–2021 |