Inventor
HIROKI MURAKAMI
Inventor
JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H01LSemiconductor devices16%
C23CCoating metallic material14%
H01JElectric discharge tubes or discharge lamps11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G05BControl or regulating systems in general4%
G05FSystems for regulating electric or magnetic variables4%
B05DProcesses for applying fluent materials to surfaces, in general1%
B25JManipulators1%
PatentTitleYear
12,540,394Selective film formation using self-assembled monolayer202612,488,991Substrate processing method and substrate processing apparatus202512,411,472Numerical control device202512,400,870Substrate processing method and substrate processing apparatus202512,288,671Film deposition apparatus for fine pattern forming202512,032,396Voltage generating circuit and semiconductor device for suppressing leakage current202411,996,296Substrate processing method and substrate processing system202411,915,914Film forming method and film forming apparatus202411,881,379Film deposition apparatus for fine pattern forming202411,839,971Teaching control method for robot, robot system, and computer program202311,830,741Method for forming film202311,489,385Rotor, rotary electric machine, and method for manufacturing rotor202211,474,493Numerical controller, machining route setting method, and non-transitory computer-readable medium recording a program202211,462,126Work support device and work supporting method202211,435,220Combination weighing device with selectable weighing hoppers202211,404,272Film deposition apparatus for fine pattern forming202211,404,271Film deposition apparatus for fine pattern forming202211,380,538Method of forming nitride film and apparatus for forming nitride film202211,322,365Substrate processing method and substrate processing apparatus202211,323,067Oscillator circuit and semiconductor integrated circuit202211,306,953Compressor and refrigeration cycle apparatus202211,273,866Torque sensor and electric power steering system202211,269,365Voltage-generating circuit and semiconductor device using the same2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to TOKYO ELECTRON LTD (12)· patent assignee history
2022–2024Patents assigned to WINBOND ELECTRONICS CORP (3)· patent assignee history
2022–2025Patents assigned to FANUC CORP (2)· patent assignee history
2022Patents assigned to MITSUBISHI ELECTRIC CORP (2)· patent assignee history
2022Patents assigned to HITACHI ASTEMO LTD (1)· patent assignee history
2022–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 12 | 2022–2026 |
| WINBOND ELECTRONICS CORP | 3 | 2022–2024 |
| FANUC CORP | 2 | 2022–2025 |
| MITSUBISHI ELECTRIC CORP | 2 | 2022 |
| HITACHI ASTEMO LTD | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 23 | 2022–2026 |