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Inventor

Shifeng He

Inventor
Shanghai, CN

Overview

2→
Patents
2020
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
10,679,881Overlay measurement method and apparatus202010,658,210Apparatus and method for detecting overlay mark with bright and dark fields2020

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020Patents assigned to SEMICONDUCTOR MFG INT BEIJING CORP (2)· patent assignee history
2020Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI CORP (2)· patent assignee history
2020Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMICONDUCTOR MFG INT BEIJING CORP22020
SEMICONDUCTOR MFG INT SHANGHAI CORP22020
Locations
LocationPatentsSpan
Shanghai, CN22020