Inventor
Shinya Hirano
Inventor
Yokohama, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material22%
H01JElectric discharge tubes or discharge lamps22%
H10BElectronic memory devices22%
H10NElectric solid-state devices not otherwise provided for22%
G11CStatic stores11%
PatentTitleYear
8,415,756'Semiconductor device and method of manufacturing the same'20137,906,346'Method for manufacturing a magnetic memory device and magnetic memory device'20116,875,326'Plasma processing apparatus with real-time particle filter'20056,638,403'Plasma processing apparatus with real-time particle filter'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2005Patents assigned to HITACHI LTD (2)· patent assignee history
2003–2005Patents assigned to NANOFILM TECHNOLOGIES INT (2)· patent assignee history
2003–2005Based in Yokohama, JP· patent location history
2011–2013Patents assigned to RENESAS ELECTRONICS CORP (2)· patent assignee history
2011Based in Tokyo, JP· patent location history
2013Patents assigned to FUJIYAMA YUICHIRO (1)· patent assignee history
2013Patents assigned to HIRANO SHINYA (1)· patent assignee history
2013Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 2 | 2003–2005 |
| NANOFILM TECHNOLOGIES INT | 2 | 2003–2005 |
| RENESAS ELECTRONICS CORP | 2 | 2011–2013 |
| FUJIYAMA YUICHIRO | 1 | 2013 |
| HIRANO SHINYAself | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 2 | 2003–2005 |
| Kanagawa, JP | 1 | 2013 |
| Tokyo, JP | 1 | 2011 |