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Inventor

Mitsutaka Tsubokura

Inventor
Itami, JP

Overview

4→
Patents
2004–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
B21BRolling of metal9%
C22BProduction and refining of metals9%
C22CAlloys9%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys9%
C25CProcesses for the electrolytic production, recovery or refining of metals9%
H01LSemiconductor devices9%
H10DInorganic electric semiconductor devices9%
Y02PClimate change mitigation technologies in the production or processing of goods9%
Y10TTechnical subjects covered by former us classification9%
PatentTitleYear
11,066,724Method for separating metal components20219,181,608'Magnesium alloy sheet'20159,000,567'Compound semiconductor substrate'20156,756,607'Method and device for determining backgate characteristics'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2021Patents assigned to SUMITOMO ELECTRIC INDUSTRIES (4)· patent assignee history
2004–2015Based in Itami, JP· patent location history
2015Patents assigned to TSUBOKURA MITSUTAKA (2)· patent assignee history
2015Patents assigned to FUJIWARA SHINYA (1)· patent assignee history
2015Patents assigned to INOKUCHI KOHJI (1)· patent assignee history
2021Patents assigned to AIST (1)· patent assignee history
2021Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO ELECTRIC INDUSTRIES42004–2021
TSUBOKURA MITSUTAKAself22015
AIST12021
FUJIWARA SHINYA12015
INOKUCHI KOHJI12015
Locations
LocationPatentsSpan
Itami, JP32004–2015
Osaka, JP12021