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Inventor

Ryuji Sotoaka

Inventor
Ibaraki, JP

Overview

8→
Patents
1999–2014
Patent span
Electricity
Primary field (CPC H)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
C11DDetergent compositions12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%
B08BCleaning in general8%
A61KPreparations for medical, dental or toiletry purposes4%
A61LMethods or apparatus for sterilising materials or objects in general4%
A61QSpecific use of cosmetics or similar toiletry preparations4%
A62DChemical means for extinguishing fires or for combating or protecting against harmful chemical agents4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
PatentTitleYear
8,883,652'Silicon etching liquid and etching method'20148,562,855'Silicon etching liquid and etching method'20137,892,404'Method for oxidizing substance and oxidation apparatus therefor'20116,875,288'Cleaning agent and cleaning method'20056,843,981'Tooth bleaching compositions and methods of bleaching discolored tooth'20056,514,352'Cleaning method using an oxidizing agent, chelating agent and fluorine compound'20036,265,309'Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same'20015,972,862'Cleaning liquid for semiconductor devices'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2014Patents assigned to MITSUBISHI GAS CHEMICAL CO (7)· patent assignee history
1999–2005Based in Ibaraki, JP· patent location history
2001Patents assigned to MITSUBISHI GAS CHEMICALS CO IN (1)· patent assignee history
2003–2005Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2011Based in Chiba, JP· patent location history
2013–2014Patents assigned to SOTOAKA RYUJI (2)· patent assignee history
2013–2014Patents assigned to YAGUCHI KAZUYOSHI (2)· patent assignee history
2013–2014Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO71999–2014
SOTOAKA RYUJIself22013–2014
TOKYO ELECTRON LTD22003–2005
YAGUCHI KAZUYOSHI22013–2014
MITSUBISHI GAS CHEMICALS CO IN12001
Locations
LocationPatentsSpan
Ibaraki, JP51999–2005
Tokyo, JP22013–2014
Chiba, JP12011