Inventor
DAVID FRANS SIMON DECKERS
Inventor
BE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
G05BControl or regulating systems in general44%
PatentTitleYear
12,366,809Methods and apparatus for controlling a lithographic process202511,782,349Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,754,931Method for determining corrections for lithographic apparatus202311,592,753Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,327,407Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2022–2025Based in BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| BE | 5 | 2022–2025 |