Inventor
Frederik Bijkerk
Inventor
Amsterdam, NL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G21KHandling of particles or ionising radiation not otherwise provided for16%
G02BOptical elements, systems or apparatus14%
C23CCoating metallic material8%
H05GX-ray technique8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
10,916,356Reflective optical element20219,997,268EUV-mirror, optical system with EUV-mirror and associated operating method20189,733,580'Method for producing a reflective optical element for EUV-lithography'20179,442,383'EUV-mirror arrangement, optical system with EUV-mirror arrangement and associated operating method'20168,638,494'Reflective optical element and method of manufacturing the same'20148,411,355'Reflective optical element and method of manufacturing the same'2013RE041362'Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby'20107,261,957'Multilayer system with protecting layer system and production method'20077,172,788'Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor device'20076,818,912'Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby'20046,667,484'Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby'20036,656,575'Multilayer system with protecting layer system and production method'20036,483,597'Method for the production of multi-layer systems'20026,469,310'Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus'20026,452,194'Radiation source for use in lithographic projection apparatus'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2010Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2002–2003Patents assigned to ZEISS STIFTUNG (2)· patent assignee history
2002–2010Based in Amsterdam, NL· patent location history
2007Patents assigned to ZEISS CARL SMT AG (2)· patent assignee history
2013–2021Patents assigned to ZEISS CARL SMT GMBH (6)· patent assignee history
2013Patents assigned to BIJKERK FREDERIK (1)· patent assignee history
2013–2021Based in Bosch en Duin, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 6 | 2013–2021 |
| ASML NETHERLANDS BV | 5 | 2002–2010 |
| ZEISS CARL SMT AG | 2 | 2007 |
| ZEISS STIFTUNG | 2 | 2002–2003 |
| BIJKERK FREDERIKself | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Amsterdam, NL | 9 | 2002–2010 |
| Bosch en Duin, NL | 6 | 2013–2021 |