Inventor
Akira Iio
Inventor
Yokkaichi, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere15%
C09GPolishing compositions13%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%
C07CAcyclic or carbocyclic compounds8%
C08LCompositions of macromolecular compounds8%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
B24BMachines, devices, or processes for grinding or polishing3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds3%
PatentTitleYear
6,740,590'AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING USED FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, METHOD FOR MANUFACTURE OF SEMICONDUCTOR DEVICES, AND METHOD FOR FORMATION OF EMBEDDED WRITING'20046,565,767'Polymer particles and polishing material containing them'20036,454,819'Composite particles and production process thereof, aqueous dispersion, aqueous dispersion composition for chemical mechanical polishing, and process for manufacture of semiconductor device'20026,409,780'Water-laden solid matter of vapor-phase processed inorganic oxide particles and slurry for polishing and manufacturing method of semiconductor devices'20026,375,545'Chemical mechanical method of polishing wafer surfaces'20026,068,769'Aqueous dispersion slurry of inorganic particles and production methods thereof'20005,202,388'Process for producing hydrogenation product of ring-opening polymer'19935,164,469'Transparent resin material'19925,053,471'Transparent resin material'19914,699,938'Pressure-sensitive adhesive composition'19874,246,427'Process for producing methacrylic acid'19814,039,583'Process for producing methacrolein'19774,036,901'Process for producing styrene'1977Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1977–1993Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (7)· patent assignee history
1977–2002Based in Yokkaichi, JP· patent location history
1987Patents assigned to NITTO ELECTRIC IND CO (1)· patent assignee history
1987–2004Based in Tokyo, JP· patent location history
2000–2004Patents assigned to JSR CORP (6)· patent assignee history
2002–2004Patents assigned to TOSHIBA KK (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JAPAN SYNTHETIC RUBBER CO LTD | 7 | 1977–1993 |
| JSR CORP | 6 | 2000–2004 |
| TOSHIBA KK | 4 | 2002–2004 |
| NITTO ELECTRIC IND CO | 1 | 1987 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokkaichi, JP | 8 | 1977–2002 |
| Tokyo, JP | 5 | 1987–2004 |