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Inventor

Ivo Vanderhallen

Inventor
Eindhoven, NL

Overview

3→
Patents
2016–2018
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H05GX-ray technique29%
G02BOptical elements, systems or apparatus14%
G21KHandling of particles or ionising radiation not otherwise provided for14%
PatentTitleYear
9,983,482Radiation collector, radiation source and lithographic apparatus20189,632,419'Radiation source'20179,335,641'Optical element mount for lithographic apparatus'2016

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2018Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2016–2017Patents assigned to VANDERHALLEN IVO (2)· patent assignee history
2016Patents assigned to BEERENS RUUD ANTONIUS CATHARINA MARIA (1)· patent assignee history
2016–2018Based in Eindhoven, NL· patent location history
2017Patents assigned to BANINE VADIM YEVGENYEVICH (1)· patent assignee history
2017Patents assigned to FRIJNS OLAV WALDEMAR VLADIMIR (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32016–2018
VANDERHALLEN IVOself22016–2017
BANINE VADIM YEVGENYEVICH12017
BEERENS RUUD ANTONIUS CATHARINA MARIA12016
FRIJNS OLAV WALDEMAR VLADIMIR12017
Locations
LocationPatentsSpan
Eindhoven, NL32016–2018