Inventor
Jong-An Kim
Inventor
Seoul, KR
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
G06TImage data processing or generation, in general10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
H10DInorganic electric semiconductor devices7%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
H10KOrganic electric solid-state devices7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
H01JElectric discharge tubes or discharge lamps5%
PatentTitleYear
10,925,558X-ray detector and method for controlling the same20219,045,349'Method for preparing porous alumina'20158,769,292'Method for generating standard file based on steganography technology and apparatus and method for validating integrity of metadata in the standard file'20148,546,154'Apparatus and method to inspect defect of semiconductor device'20138,153,339'Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask'20128,126,258'Method of detecting defects in patterns on semiconductor substrate by comparing second image with reference image after acquiring second image from first image and apparatus for performing the same'20128,055,056'Method of detecting defects of patterns on a semiconductor substrate and apparatus for performing the same'20118,055,057'Method for detecting defects in a substrate having a semiconductor device thereon'20118,050,488'Method of analyzing a wafer sample'20118,034,640'Apparatus and method to inspect defect of semiconductor device'20117,804,591'Wafer inspecting method'20107,767,506'Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask'20107,728,966'Optical inspection tool having lens unit with multiple beam paths for detecting surface defects of a substrate and methods of using same'20107,449,352'Mask and manufacturing method of a semiconductor device and a thin film transistor array panel using the mask'20086,074,974'Manufacturing method of granulated complex molecular sieve composition having multi-functions'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2015Patents assigned to KOREA RES INST CHEM TECH (2)· patent assignee history
2000–2015Based in Daejeon, KR· patent location history
2008–2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (12)· patent assignee history
2008–2021Based in Suwon-si, KR· patent location history
2010–2014Based in Seoul, KR· patent location history
2012–2014Patents assigned to KIM JONG-AN (4)· patent assignee history
2012–2013Patents assigned to YANG YU-SIN (2)· patent assignee history
2015Patents assigned to AHN HONG CHAN (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 12 | 2008–2021 |
| KIM JONG-ANself | 4 | 2012–2014 |
| KOREA RES INST CHEM TECH | 2 | 2000–2015 |
| YANG YU-SIN | 2 | 2012–2013 |
| AHN HONG CHAN | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 9 | 2010–2014 |
| Suwon-si, KR | 4 | 2008–2021 |
| Daejeon, KR | 2 | 2000–2015 |