Inventor
Robert Primig
Inventor
Mnchen, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1043%
H10DInorganic electric semiconductor devices29%
H01GCapacitors14%
H10BElectronic memory devices14%
PatentTitleYear
6,573,542'Capacitor electrodes arrangement with oxygen iridium between silicon and oxygen barrier layer'20036,440,210'Method for producing self-polarized ferro-electric layers, especially PZT layers, with a rhombohedral crystal structure'20026,346,424'Process for producing high-epsilon dielectric layer or ferroelectric layer'20026,108,191'Multilayer capacitor with high specific capacitance and production process therefor'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2002Patents assigned to SIEMENS AG (2)· patent assignee history
2000Based in Munich, DE· patent location history
2002–2003Patents assigned to INFINEON TECHNOLOGIES AG (2)· patent assignee history
2002–2003Based in Mnchen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INFINEON TECHNOLOGIES AG | 2 | 2002–2003 |
| SIEMENS AG | 2 | 2000–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mnchen, DE | 3 | 2002–2003 |
| Munich, DE | 1 | 2000 |