Inventor
Hoite Pieter Theodoor Tolsma
Inventor
Eindhoven, NL
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G01BMeasuring length, thickness or similar linear dimensions8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
G05BControl or regulating systems in general8%
H01LSemiconductor devices8%
Y02PClimate change mitigation technologies in the production or processing of goods8%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
G01SRadio direction-finding4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%
PatentTitleYear
10,996,176Methods and apparatus for measuring a property of a substrate202110,746,668Methods and apparatus for measuring a property of a substrate202010,705,438Lithographic method202010,571,814Lithographic method202010,317,191Methods and apparatus for measuring a property of a substrate20199,594,029'Methods and apparatus for measuring a property of a substrate'20178,908,152'Lithographic apparatus and device manufacturing method to determine improved absolute position of exposure fields using mark structures'20148,139,217'Alignment systems and methods for lithographic systems'20127,880,880'Alignment systems and methods for lithographic systems'20117,773,235'Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus'20107,439,531'Alignment systems and methods for lithographic systems'20087,410,735'Method of characterization, method of characterizing a process operation, and device manufacturing method'20087,409,302'Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped with such an apparatus'20087,332,732'Alignment systems and methods for lithographic systems'20087,329,888'Alignment systems and methods for lithographic systems'20087,297,971'Alignment systems and methods for lithographic systems'20077,259,828'Alignment system and method and device manufactured thereby'20077,002,667'Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby'20066,995,831'Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2021Patents assigned to ASML NETHERLANDS BV (19)· patent assignee history
2006–2021Based in Eindhoven, NL· patent location history
2012–2014Patents assigned to TOLSMA HOITE PIETER THEODOOR (2)· patent assignee history
2012Patents assigned to BURGHOORN JACOBUS (1)· patent assignee history
2012Patents assigned to DUNBAR ALLAN REUBEN (1)· patent assignee history
2014Patents assigned to BIJNEN FRANCISCUS GODEFRIDUS CASPER (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 19 | 2006–2021 |
| TOLSMA HOITE PIETER THEODOORself | 2 | 2012–2014 |
| BIJNEN FRANCISCUS GODEFRIDUS CASPER | 1 | 2014 |
| BURGHOORN JACOBUS | 1 | 2012 |
| DUNBAR ALLAN REUBEN | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 19 | 2006–2021 |