Inventor
Kenji Yokomizo
Inventor
Tokyo, JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
H05KPrinted circuits8%
Y10TTechnical subjects covered by former us classification8%
F26BDrying solid materials or objects by removing liquid therefrom6%
G02BOptical elements, systems or apparatus6%
B08BCleaning in general4%
B21BRolling of metal4%
C22CAlloys4%
C25DProcesses for the electrolytic or electrophoretic production of coatings4%
PatentTitleYear
11,105,992Optical fiber ribbon and optical fiber cable202111,036,024Method for manufacturing intermittent bonding type optical fiber ribbon and intermittent bonding type optical fiber ribbon202110,882,783Optical fiber ribbon and optical fiber cable20218,303,723'Liquid processing apparatus, liquid processing method, and storage medium'20128,221,897'Rolled copper foil'20127,842,397'Nickel plating solution and its preparation method, nickel plating method and printed wiring board copper foil'20107,789,977'Rolled copper foil and manufacturing method thereof'20107,678,199'Substrate cleaning method'20107,270,137'Apparatus and method of securing a workpiece during high-pressure processing'20077,108,923'Copper foil for printed circuit board with taking environmental conservation into consideration'20066,780,277'Etching method and etching apparatus'20046,558,476'Substrate processing method'20036,399,517'Etching method and etching apparatus'20026,199,564'Substrate processing method and apparatus'20015,890,389'Method of manufacturing modified cross-section material'19995,817,185'Method for washing substrates'19985,730,162'Apparatus and method for washing substrates'19985,671,544'Substrate drying apparatus and substrate drying method'19975,575,079'Substrate drying apparatus and substrate drying method'19965,503,171'Substrates-washing apparatus'19965,435,075'Spindrier'19955,327,921'Processing vessel for a wafer washing system'19945,297,910'Transportation-transfer device for an object of treatment'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2012Patents assigned to TOKYO ELECTRON LTD (15)· patent assignee history
1994–1997Patents assigned to TEL KYUSHU KK (5)· patent assignee history
1994–1996Based in Oonojo, JP· patent location history
1998–2012Based in Austin, TX, US· patent location history
1999–2012Patents assigned to HITACHI CABLE (5)· patent assignee history
1999–2021Based in Tokyo, JP· patent location history
2001–2004Based in Round Rock, TX, US· patent location history
2006–2010Based in Taito-ku, JP· patent location history
2012Patents assigned to YOKOMIZO KENJI (2)· patent assignee history
2021Patents assigned to FURUKAWA ELECTRIC CO LTD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 15 | 1994–2012 |
| HITACHI CABLE | 5 | 1999–2012 |
| TEL KYUSHU KK | 5 | 1994–1997 |
| FURUKAWA ELECTRIC CO LTD | 3 | 2021 |
| YOKOMIZO KENJIself | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 1999–2021 |
| Austin, Texas, US | 4 | 1998–2012 |
| Round Rock, Texas, US | 4 | 2001–2004 |
| Oonojo, JP | 3 | 1994–1996 |
| Taito-ku, JP | 2 | 2006–2010 |