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Inventor

Yuzuru Ishida

Inventor
Yokohama, JP

Overview

51→
Patents
1983–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 51 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters51%
Y10TTechnical subjects covered by former us classification11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C08LCompositions of macromolecular compounds7%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
D06MTreatment, not provided for elsewhere in class d06, of fibres, threads, yarns, fabrics, feathers or fibrous goods made from such materials3%
B01FMixing, e.g. dissolving, emulsifying or dispersing1%
B29CShaping or joining of plastics1%
C09DCoating compositions, e.g. paints, varnishes or lacquers1%
PatentTitleYear
11,104,126Liquid ejection apparatus, ejection control method, and liquid ejection head202111,020,966Liquid ejection head substrate, method of manufacturing liquid ejection head substrate, and liquid ejection head202110,766,256Liquid ejection head substrate, method of manufacturing same and liquid ejection head202010,730,294Liquid-discharge-head substrate, liquid discharge head, and method for manufacturing liquid-discharge-head substrate202010,710,361Liquid discharge head substrate, liquid discharge head, liquid discharge apparatus, and method of controlling liquid discharge head202010,675,866Liquid discharge head substrate, liquid discharge head, liquid discharge apparatus, and method of controlling liquid discharge head202010,632,748Liquid ejection head202010,538,085Liquid discharge head substrate, liquid discharge head, and method for disconnecting fuse portion in liquid discharge head substrate202010,421,272Control method of liquid ejection head and liquid ejection apparatus201910,201,970Liquid ejection head, liquid ejection apparatus, and control method20199,868,283'Liquid discharge head cleaning method and liquid discharge apparatus'20189,816,195'Reproduction method of liquid ejecting head'20179,682,552'Liquid ejection head, method of cleaning the same, and recording apparatus'20179,630,399'Method for cleaning liquid ejection head'20179,610,778'Liquid discharge head and method for producing liquid discharge head'20179,527,290'Method of cleaning liquid discharge head'20169,498,956'Liquid ejection head, method for cleaning the head, recording apparatus provided with the head'20169,427,953'Method of manufacturing liquid ejection head'20169,421,765'Method of manufacturing liquid discharging head'20169,346,274'Method for cleaning liquid ejection head'20169,333,746'Ink jet recording head substrate, method for manufacturing the same, and ink jet recording head'20169,308,722'Liquid ejection head and liquid ejection apparatus'20169,266,331'Manufacturing method of substrate for liquid ejection head'20169,179,503'Method for manufacturing liquid ejection head'20159,120,310'Recording element substrate, method of manufacturing the recording element substrate, and liquid ejection head'20159,114,612'Liquid ejecting head, substrate for liquid ejecting head, and printing apparatus'20159,096,059'Substrate for inkjet head, inkjet head, and inkjet printing apparatus'20159,090,112'Liquid discharge device and cleaning method for liquid discharge head'20159,085,143'Substrate for inkjet print head, inkjet print head, method for manufacturing inkjet print head, and inkjet printing apparatus'20159,061,489'Substrate for inkjet head and inkjet head having protection layer including individual sections corresponding to heating resistors'20159,056,461'Method for driving liquid discharge head, liquid discharge head, and liquid discharge apparatus'20159,004,650'Liquid discharge head, cleaning method for liquid discharge head, liquid discharge apparatus, and substrate for liquid discharge head'20158,943,690'Method for manufacturing substrate for liquid ejection head and method for manufacturing liquid ejection head'20158,846,162'Manufacturing method for liquid-discharge head substrate'20148,721,050'Liquid discharge head with protective layer and liquid discharge device'20148,721,048'Substrate for liquid discharge head and liquid discharge head'20148,646,169'Method of manufacturing liquid ejection head having protective layer containing a noble metal'20148,312,628'Liquid discharge head and method for manufacturing the same'20128,191,988'Liquid ejection head, liquid-ejection head substrate, liquid ejecting apparatus including liquid ejection head, and method of cleaning liquid ejection head'20128,172,371'Liquid ejection head having protective layer containing a noble metal'20126,153,675'Fluorinated water-and oil-repellent agents with improved freeze-thaw stability'20006,121,372'Aqueous emulsion component for a water- and oil-repellant agent'20005,965,656'Process for preparing aqueous emulsion'19995,397,498'Method for cleaning molding machine in which residual thermoplastic resins remain and cleaning composition therefor'19955,185,394'Rubber-modified styrene type resin composition excellent in sliding properties'19935,151,457'Resin compositions having improved antistatic properties'19924,987,170'Styrene resin composition excellent in sliding properties'19914,460,278'Continuous bulk polymerization reactor'19844,388,447'Process for producing rubber modified styrene resins'19834,378,452'Method of manufacturing rubber modified styrene resins'19834,376,847'Process for the production of styrene polymers'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1983–1995Patents assigned to MITSUI TOATSU CHEMICALS (8)· patent assignee history
1983–2021Based in Yokohama, JP· patent location history
1991–1995Based in Kanagawa, JP· patent location history
1999–2000Based in Kitaibaraki, JP· patent location history
2012–2021Patents assigned to CANON KK (39)· patent assignee history
2012–2016Patents assigned to ISHIDA YUZURU (9)· patent assignee history
2012–2016Patents assigned to MATSUI TAKAHIRO (6)· patent assignee history
2012–2016Patents assigned to SAITO ICHIRO (6)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK392012–2021
ISHIDA YUZURUself92012–2016
MITSUI TOATSU CHEMICALS81983–1995
MATSUI TAKAHIRO62012–2016
SAITO ICHIRO62012–2016
Locations
LocationPatentsSpan
Yokohama, JP441983–2021
Kanagawa, JP41991–1995
Kitaibaraki, JP31999–2000