Inventor
Jungmin Ko
Inventor
Seoul, KR
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
A47LDomestic washing or cleaning20%
H01LSemiconductor devices20%
B01DSeparation14%
H01JElectric discharge tubes or discharge lamps8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
B04CApparatus using free vortex flow, e.g. cyclones5%
H10DInorganic electric semiconductor devices3%
B08BCleaning in general2%
PatentTitleYear
10,856,711Vacuum cleaner202010,632,478Dust collector and cleaner having the same202010,629,473Footing removal for nitride spacer202010,600,639SiN spacer profile patterning202010,517,453Dust collector and vacuum cleaner having the same201910,424,487Atomic layer etching processes201910,403,507Shaped etch profile with oxidation201910,398,272Vacuum cleaner201910,376,116Vacuum cleaner201910,362,912Vacuum cleaner201910,314,451Vacuum cleaner201910,314,448Vacuum cleaner201910,299,645Vacuum cleaner201910,299,646Vacuum cleaner201910,299,647Vacuum cleaner201910,271,702Vacuum cleaner201910,271,701Dust collector and vacuum cleaner having the same201910,242,908Airgap formation with damage-free copper201910,062,575Poly directional etch by oxidation201810,026,621SiN spacer profile patterning20189,721,807'Cyclic spacer etching process with improved profile control'20179,543,163'Methods for forming features in a material layer utilizing a combination of a main etching and a cyclical etching process'20179,520,302'Methods for controlling Fin recess loading'20169,478,433'Cyclic spacer etching process with improved profile control'20169,368,369'Methods for forming a self-aligned contact via selective lateral etch'20169,293,568'Method of fin patterning'20168,236,188'Method for low-K dielectric etch with reduced damage'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012Patents assigned to BAILEY III ANDREW D (1)· patent assignee history
2012Patents assigned to CHENG YU (1)· patent assignee history
2012Patents assigned to DELGADINO GERARDO A (1)· patent assignee history
2016–2020Patents assigned to APPLIED MATERIALS INC (13)· patent assignee history
2016–2020Based in San Jose, CA, US· patent location history
2016–2017Based in San Jacinto, CA, US· patent location history
2016Based in Fremont, CA, US· patent location history
2017Based in Santa Clara, CA, US· patent location history
2019–2020Patents assigned to LG ELECTRONICS INC (13)· patent assignee history
2019–2020Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 13 | 2016–2020 |
| LG ELECTRONICS INC | 13 | 2019–2020 |
| BAILEY III ANDREW D | 1 | 2012 |
| CHENG YU | 1 | 2012 |
| DELGADINO GERARDO A | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 13 | 2019–2020 |
| San Jose, California, US | 9 | 2016–2020 |
| San Jacinto, California, US | 2 | 2016–2017 |
| Santa Clara, California, US | 1 | 2017 |
| Fremont, California, US | 1 | 2016 |