Inventor
ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN
Inventor
NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices45%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
H01LSemiconductor devices11%
F16KValves5%
G05DSystems for controlling or regulating non-electric variables5%
H02NElectric machines not otherwise provided for5%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
12,566,382Fluid handling system, method and lithographic apparatus202612,529,964Fluid handling system, method and lithographic apparatus202612,443,115Measurement system and method for characterizing a patterning device202512,429,778Fluid handling system, method and lithographic apparatus202512,287,570Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus202512,287,580Fluid handling system, method and lithographic apparatus202512,242,200Lithography apparatus and a method of manufacturing a device202512,072,635Lithographic apparatus and a method of operating the apparatus202412,072,636Fluid handling system and lithographic apparatus202411,774,857Lithography apparatus and device manufacturing method202311,720,032Process tool and an inspection method202311,614,689Fluid handling structure and lithographic apparatus202311,372,336Lithography apparatus and device manufacturing method202211,231,653Fluid handling structure and lithographic apparatus202211,199,771Pressure control valve, a fluid handling structure for lithographic apparatus and a lithographic apparatus202111,187,991Lithographic apparatus and a method of operating the apparatus202111,143,969Method of performance testing working parameters of a fluid handling structure and a method of detecting loss of immersion liquid from a fluid handing structure in an immersion lithographic apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2021–2026Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 17 | 2021–2026 |