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Inventor

Maxwell Lai

Inventor
Hsinchu, TW

Overview

1→
Patents
2002
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10DInorganic electric semiconductor devices50%
PatentTitleYear
6,465,139'Mask pattern for defining a floating gate region'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history
2002Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG12002
Locations
LocationPatentsSpan
Hsinchu, TW12002