Inventor
Masaya Nagato
Inventor
Toyama, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material35%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01JElectric discharge tubes or discharge lamps6%
PatentTitleYear
10,968,517Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202110,910,214Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202110,586,698Method of manufacturing semiconductor device, substrate processing apparatus and recording medium202010,156,012Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording medium201810,096,463Method of manufacturing semiconductor device, substrate processing apparatus comprising exhaust port and multiple nozzles, and recording medium20189,976,214Cleaning method and method of manufacturing semiconductor device2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2021Patents assigned to HITACHI INT ELECTRIC INC (5)· patent assignee history
2018–2021Patents assigned to KOKUSAI ELECTRIC CORP (4)· patent assignee history
2018Patents assigned to CENTRAL GLASS CO LTD (1)· patent assignee history
2018–2021Based in Toyama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 5 | 2018–2021 |
| KOKUSAI ELECTRIC CORP | 4 | 2018–2021 |
| CENTRAL GLASS CO LTD | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 6 | 2018–2021 |