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Inventor

Stefan Hien

Inventor
Erlangen, DE

Overview

4→
Patents
2000–2004
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests29%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%
PatentTitleYear
6,703,190'Method for producing resist structures'20046,514,663'Bottom resist'20036,306,990'Film-forming polymers'20016,063,543'Radiation-sensitive mixture and its use'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to SIEMENS AG (2)· patent assignee history
2000–2003Based in Erlangen, DE· patent location history
2003–2004Patents assigned to INFINEON TECHNOLOGIES AG (2)· patent assignee history
2004Based in Austin, TX, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG22003–2004
SIEMENS AG22000–2001
Locations
LocationPatentsSpan
Erlangen, DE32000–2003
Austin, Texas, US12004