Inventor
Ismail Kashkoush
Inventor
Orefield, PA, US
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
Y10TTechnical subjects covered by former us classification10%
C11DDetergent compositions7%
H01LSemiconductor devices7%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B08BCleaning in general6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
PatentTitleYear
10,991,589Correlation between conductivity and pH measurements for KOH texturing solutions and additives202110,181,405Method for selective under-etching of porous silicon201910,170,350Correlation between conductivity and pH measurements for KOH texturing solutions and additives20199,337,065'Systems and methods for drying a rotating substrate'20168,987,032'Method for selective under-etching of porous silicon'20158,741,066'Method for cleaning substrates utilizing surface passivation and/or oxide layer growth to protect from pitting'20148,739,429'Systems and methods for drying a rotating substrate'20148,276,291'Systems and methods for drying a rotating substrate'20128,084,280'Method of manufacturing a solar cell using a pre-cleaning step that contributes to homogeneous texture morphology'20118,056,253'Systems and methods for drying a rotating substrate'20117,976,718'System and method for selective etching of silicon nitride during substrate processing'20117,644,512'Systems and methods for drying a rotating substrate'20107,311,847'System and method for point-of-use filtration and purification of fluids used in substrate processing'20077,169,253'Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing'20076,928,750'Membrane dryer'20056,871,657'Low profile wafer carrier'20056,863,836'Method for removal of photoresist using sparger'20056,842,998'Membrane dryer'20056,840,250'Nextgen wet process tank'20056,837,944'Cleaning and drying method and apparatus'20056,818,563'Process and apparatus for removal of photoresist from semiconductor wafers using spray nozzles'20046,767,877'Method and system for chemical injection in silicon wafer processing'20046,766,818'Chemical concentration control device'20046,649,018'System for removal of photoresist using sparger'20036,626,189'Method of processing substrates using pressurized mist generation'20036,532,974'Process tank with pressurized mist generation'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2005Patents assigned to AKRION LLC (12)· patent assignee history
2003–2021Based in Orefield, PA, US· patent location history
2007Patents assigned to AKRION TECHNOLOGIES INC (2)· patent assignee history
2011–2019Patents assigned to AKRION SYSTEMS LLC (10)· patent assignee history
2011–2014Patents assigned to KASHKOUSH ISMAIL (4)· patent assignee history
2019–2021Patents assigned to NAURA AKRION INC (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AKRION LLC | 12 | 2003–2005 |
| AKRION SYSTEMS LLC | 10 | 2011–2019 |
| KASHKOUSH ISMAILself | 4 | 2011–2014 |
| NAURA AKRION INC | 3 | 2019–2021 |
| AKRION TECHNOLOGIES INC | 2 | 2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Orefield, Pennsylvania, US | 26 | 2003–2021 |