LexDanaLexDanabeta
Inventor

Shao-Chung Hsu

Inventor
Hsinchu, TW

Overview

2→
Patents
2002–2004
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G06FElectric digital data processing33%
G07CTime or attendance registers33%
PatentTitleYear
6,799,152'Critical dimension statistical process control in semiconductor fabrication'20046,368,761'Procedure of alignment for optimal wafer exposure pattern'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2004Patents assigned to MACRONIX INT CO LTD (2)· patent assignee history
2002–2004Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MACRONIX INT CO LTD22002–2004
Locations
LocationPatentsSpan
Hsinchu, TW22002–2004