LexDanaLexDanabeta
Inventor

Leendert Jan KARSSEMEIJER

Inventor
NL

Overview

3→
Patents
2024–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G01BMeasuring length, thickness or similar linear dimensions25%
PatentTitleYear
12,461,457Asymmetry extended grid model for wafer alignment202512,189,314Metrology method and associated metrology and lithographic apparatuses202512,032,299Metrology method and associated metrology and lithographic apparatuses2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2024Patents assigned to ASML HOLDING NV (1)· patent assignee history
2024–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32024–2025
ASML HOLDING NV12024
Locations
LocationPatentsSpan
NL32024–2025