Inventor

Chun-Kuang Chen

Inventor
Hsinchu County, TW

Overview

83→
Patents
2005–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 83 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10DInorganic electric semiconductor devices14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H05BElectric heating6%
G06FElectric digital data processing2%
Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications2%
F21YIndexing scheme associated with subclasses f21k, f21l, f21s and f21v, relating to the form or the kind of the light sources or of the colour of the light emitted1%
F21KNon-electric light sources using luminescence1%
PatentTitleYear
10,880,981Collector pellicle202010,871,713Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning202010,861,790Power strap structure for high performance and low current density202010,833,061Semiconductor device including source/drain contact having height below gate stack202010,818,509Method of fabricating semiconductor device with reduced trench distortions202010,784,168Dummy MOL removal for performance enhancement202010,763,113Lithographic technique for feature cut by line-end shrink202010,720,419Layout modification method for exposure manufacturing process202010,712,651Method and apparatus for collecting information used in image-error compensation202010,714,357Methods for improved critical dimension uniformity in a semiconductor device fabrication process202010,665,585Structure and method for alignment marks202010,642,158Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning202010,510,688Via rail solution for high power electromigration201910,388,523Lithographic technique for feature cut by line-end shrink201910,366,973Layout modification method for exposure manufacturing process201910,345,718Pattern forming method and apparatus for lithography201910,312,109Lithographic technique incorporating varied pattern materials201910,276,377Method for patterning interconnects201910,276,499Dual power structure with connection pins201910,203,606Apparatus and method for dispensing developer onto semiconductor substrate201910,177,133Semiconductor device including source/drain contact having height below gate stack201910,170,422Power strap structure for high performance and low current density201910,169,515Layout modification method and system201910,163,738Structure and method for overlay marks201810,163,654Method of fabricating semiconductor device with reduced trench distortions201810,146,141Lithography process and system with enhanced overlay quality201810,114,291Grafting agent for forming spacer layer201810,096,522Dummy MOL removal for performance enhancement201810,032,639Methods for improved critical dimension uniformity in a semiconductor device fabrication process201810,007,177Method to define multiple layer patterns using double exposures20189,997,404Method of forming an interconnect structure for a semiconductor device20189,991,132Lithographic technique incorporating varied pattern materials20189,984,876Lithographic technique for feature cut by line-end shrink20189,911,697'Power strap structure for high performance and low current density'20189,814,111'Modular light control device and dimming control system'20179,793,211'Dual power structure with connection pins'20179,754,881'Designed-based interconnect structure in semiconductor structure'20179,728,407'Method of forming features with various dimensions'20179,684,236'Method of patterning a film layer'20179,613,850'Lithographic technique for feature cut by line-end shrink'20179,560,701'Driving circuit and lamps'20179,543,406'Structure and method for overlay marks'20179,538,594'Lamp'20179,530,660'Multiple directed self-assembly patterning process'20169,449,880'Fin patterning methods for increased process margin'20169,431,297'Method of forming an interconnect structure for a semiconductor device'20169,418,868'Method of fabricating semiconductor device with reduced trench distortions'20169,412,649'Method of fabricating semiconductor device'20169,383,657'Method and structure for lithography processes with focus monitoring and control'20169,323,155'Double patterning strategy for contact hole and trench in photolithography'20169,307,614'Color temperature and illumination adjusting system, and method thereof'20169,281,273'Designed-based interconnect structure in semiconductor structure'20169,214,347'Overlay mark assistant feature'20159,210,778'Integrated wireless and wired light control system'20159,148,751'Wireless control system and wireless network expansion method applied thereto'20159,107,255'Light-emitting diode light tube driving circuit'20159,055,625'Control method of lamp'20159,055,626'Dimmer circuit and lighting apparatus using the same'20159,000,525'Structure and method for alignment marks'20158,981,669'Lamps and control circuit'20158,884,527'Lamps'20148,847,505'Illumination control circuit and illumination control method'20148,758,963'Holographic reticle and patterning method'20148,741,552'Double patterning strategy for contact hole and trench in photolithography'20148,716,951'Illumination controlling circuit and illumination system'20148,563,198'Device and method for providing wavelength reduction with a photomask'20138,511,853'Point light source and light source module using the same'20138,513,821'Overlay mark assistant feature'2013D0681863'Downlight'20138,227,150'Holographic reticle and patterning method'20128,173,548'Reverse planarization method'20128,027,529'System for improving critical dimension uniformity'20117,935,477'Double patterning strategy for contact hole and trench'20117,924,401'Seal ring arrangements for immersion lithography systems'20117,732,109'Method and system for improving critical dimension uniformity'20107,675,604'Hood for immersion lithography'20107,667,821'Multi-focus scanning with a tilted mask or wafer'20107,666,576'Exposure scan and step direction optimization'20107,517,639'Seal ring arrangements for immersion lithography systems'20097,180,572'Immersion optical projection system'20077,091,502'Apparatus and method for immersion lithography'20066,973,636'Method of defining forbidden pitches for a lithography exposure tool'20056,914,525'Alert system and method for geographic or natural disasters utilizing a telecommunications network'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (21)· patent assignee history
2005–2017Based in Taipei, TW· patent location history
2005–2007Based in Taoyuang, TW· patent location history
2009–2018Based in Hsinchu, TW· patent location history
2010–2020Based in Hsinchu County, TW· patent location history
2012–2017Patents assigned to CHEN CHUN-KUANG (12)· patent assignee history
2013–2017Patents assigned to LEXTAR ELECTRONICS CORP (14)· patent assignee history
2013–2017Patents assigned to WANG HSIEN-CHENG (3)· patent assignee history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (46)· patent assignee history
2016–2020Based in Guanxi Township, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD462016–2020
TAIWAN SEMICONDUCTOR MFG212005–2016
LEXTAR ELECTRONICS CORP142013–2017
CHEN CHUN-KUANGself122012–2017
WANG HSIEN-CHENG32013–2017
Locations
LocationPatentsSpan
Hsinchu County, TW412010–2020
Guanxi Township, TW142016–2020
Taipei, TW132005–2017
Hsinchu, TW112009–2018
Taoyuang, TW22005–2007