Inventor

Ji Cui

Inventor
Aurora, IL, US

Overview

21→
Patents
2005–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B82YSpecific uses or applications of nanostructures8%
C01FCompounds of the metals beryllium, magnesium, aluminium, calcium, strontium, barium, radium, thorium, or of the rare-earth metals8%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium8%
C09GPolishing compositions8%
Y10TTechnical subjects covered by former us classification8%
B05DProcesses for applying fluent materials to surfaces, in general5%
H01LSemiconductor devices5%
H10KOrganic electric solid-state devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
10,639,766Methods and compositions for processing dielectric substrate202010,619,075Self-stopping polishing composition and method for bulk oxide planarization202010,619,076Self-stopping polishing composition and method for bulk oxide planarization202010,522,341Composition and method for removing residue from chemical-mechanical planarization substrate201910,029,345Methods and compositions for processing dielectric substrate20189,188,284'Natural gas adsorption devices'20158,889,096'Reducing aluminosilicate scale in the bayer process'20148,623,766'Composition and method for polishing aluminum semiconductor substrates'20148,545,776'Reducing aluminosilicate scale in the Bayer process'20138,501,010'Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process'20138,455,673'Water dispersible silanes'20138,372,999'Organically modified silica and use thereof'20138,282,834'Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process'20128,106,229'Organically modifid silica and use thereof'20128,057,918'Organic light-emitting diodes and methods for assembly and enhanced charge injection'20118,053,094'Organic light-emitting diodes and methods for assembly and enhanced charge injection'20118,029,752'Approach in controlling DSP scale in bayer process'20117,911,029'Multilayer electronic devices for imbedded capacitor'20117,862,862'Water dispersible silanes as corrosion-protection coatings and paint primers for metal pretreatment'20116,939,625'Organic light-emitting diodes and methods for assembly and enhanced charge injection'20056,867,318'Composition for coating of aluminum'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2014Patents assigned to NALCO CO (10)· patent assignee history
2005–2011Patents assigned to UNIV NORTHWESTERN (3)· patent assignee history
2005–2011Based in Acton, MA, US· patent location history
2005Based in Evanston, IL, US· patent location history
2011–2015Patents assigned to CUI JI (10)· patent assignee history
2011–2019Based in Aurora, IL, US· patent location history
2011–2013Based in Naperville, IL, US· patent location history
2012–2013Patents assigned to HOLLAND BRIAN T (2)· patent assignee history
2014–2020Patents assigned to CABOT MICROELECTRONICS CORP (6)· patent assignee history
2020Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CUI JIself102011–2015
NALCO CO102005–2014
CABOT MICROELECTRONICS CORP62014–2020
UNIV NORTHWESTERN32005–2011
HOLLAND BRIAN T22012–2013
Locations
LocationPatentsSpan
Aurora, Illinois, US102011–2019
Naperville, Illinois, US42011–2013
Hsinchu, TW32020
Acton, Massachusetts, US32005–2011
Evanston, Illinois, US12005