Inventor
Masaaki Hagihara
Inventor
Beverly, MA, US
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1019%
H01JElectric discharge tubes or discharge lamps13%
PatentTitleYear
7,743,731'Reduced contaminant gas injection system and method of using'20107,709,397'Method and system for etching a high-k dielectric material'20107,700,494'Low-pressure removal of photoresist and etch residue'20107,582,220'Etching method'20097,465,673'Method and apparatus for bilayer photoresist dry development'20087,344,993'Low-pressure removal of photoresist and etch residue'20087,211,197'Etching method and plasma processing method'20076,780,342'Method of etching and method of plasma treatment'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2010Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2004–2010Based in Beverly, MA, US· patent location history
2008–2010Patents assigned to TOKYO ELECTRON LTD INC (2)· patent assignee history
2008–2010Based in Peabody, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2004–2010 |
| TOKYO ELECTRON LTD INC | 2 | 2008–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beverly, Massachusetts, US | 5 | 2004–2010 |
| Peabody, Massachusetts, US | 3 | 2008–2010 |