Inventor
Fumio Uchida
Inventor
Osaka, JP
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Nprimary
H10NElectric solid-state devices not otherwise provided for18%
B41JTypewriters14%
H01LSemiconductor devices9%
C01GCompounds containing metals not covered by subclasses c01d or c01f5%
C04BLime, magnesia5%
Y10TTechnical subjects covered by former us classification5%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds4%
G02BOptical elements, systems or apparatus4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
B28DWorking stone or stone-like materials3%
PatentTitleYear
10,865,311Coating liquid for forming piezoelectric thin film, method of producing coating liquid for forming piezoelectric thin film, piezoelectric thin film, method of manufacturing piezoelectric thin film, and liquid ejection head202010,790,436Oriented piezoelectric film and method of manufacturing same, and liquid ejection head202010,328,606Cutting apparatus201910,211,164Semiconductor package manufacturing method201910,061,293Blade holder for cutting apparatus and blade use history storage device20189,976,228Method for producing colloidal crystal and colloidal crystal20189,970,850Sheet of colloidal crystals immobilized in resin, method of displaying structural color using same, method for detecting unevenness distribution or hardness distribution of subject using same, and structural color sheet20189,970,749Sheet of colloidal crystals immobilized in resin, method of displaying structural color using same, method for detecting unevenness distribution or hardness distribution of subject using same, and structural color sheet20189,650,491'Epoxy resin composition, and method for producing the same'20179,343,650'Piezoelectric material, piezoelectric element, multilayered piezoelectric element, liquid ejection head, liquid ejection apparatus, ultrasonic motor, optical equipment, vibration apparatus, dust removing apparatus, imaging apparatus, and electronic equipment'20169,209,085'Wafer processing method'20159,105,708'Wafer processing method'20159,051,191'Bismuth iron oxide powder, manufacturing method for the bismuth iron oxide powder, dielectric ceramics, piezoelectric element, liquid discharge head, and ultrasonic motor'20159,023,961'Acrylic resin composition, method of manufacturing the same, and architectural material, fashion accessory, and optical material formed using the same'20159,017,477'Process for producing colloidal crystal and colloidal crystal'20158,715,823'Piezoelectric thin film, method of manufacturing piezoelectric thin film, piezoelectric element, and ink jet recording head'20148,704,429'Bismuth iron oxide powder, manufacturing method for the bismuth iron oxide powder, dielectric ceramics, piezoelectric element, liquid discharge head, and ultrasonic motor'20148,227,021'Method of manufacturing piezoelectric thin film'20127,456,548'Piezoelectric element, piezoelectric actuator, and ink jet recording head'20087,399,066'Piezoelectric element, ink jet recording head and producing method for piezoelectric element'20087,399,067'Piezoelectric thin film, method of manufacturing piezoelectric thin film, piezoelectric element, and ink jet recording head'20087,187,024'Piezoelectric element, ink jet recording head and method for manufacturing piezoelectric element'20077,059,709'Composition for forming piezoelectric, method for producing piezoelectric film, piezoelectric element and ink jet recording head'20067,036,915'Composition for forming piezoelectric film, producing method for piezoelectric film, piezoelectric element and ink jet recording head'20066,884,649'Method for manufacturing piezoelectric film, piezoelectric element and ink jet recording head'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2020Patents assigned to FUJI CHEMICAL KK (16)· patent assignee history
2005–2018Based in Osaka, JP· patent location history
2006–2020Patents assigned to CANON KK (11)· patent assignee history
2008–2020Based in Daito, JP· patent location history
2012–2018Patents assigned to UCHIDA FUMIO (6)· patent assignee history
2012–2014Patents assigned to KUBOTA MAKOTO (3)· patent assignee history
2015–2019Patents assigned to DISCO CORP (5)· patent assignee history
2015–2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI CHEMICAL KK | 16 | 2005–2020 |
| CANON KK | 11 | 2006–2020 |
| UCHIDA FUMIOself | 6 | 2012–2018 |
| DISCO CORP | 5 | 2015–2019 |
| KUBOTA MAKOTO | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 11 | 2005–2018 |
| Daito, JP | 9 | 2008–2020 |
| Tokyo, JP | 5 | 2015–2019 |