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Inventor

Theodorus Wilhelmus Polet

Inventor
Geldrop, NL

Overview

2→
Patents
2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
11,029,607Fluid handling structure for lithographic apparatus202110,969,695Fluid handling structure and lithographic apparatus2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2021Based in Geldrop, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22021
Locations
LocationPatentsSpan
Geldrop, NL22021