Inventor
ERIK HENRI ADRIAAN DELVIGNE
Inventor
NL
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
G05BControl or regulating systems in general21%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
11,782,349Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,774,862Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus202311,592,753Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202311,327,407Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus202211,175,591Method of obtaining measurements, apparatus for performing a process step, and metrology apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2023Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2021–2023Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2021–2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 5 | 2021–2023 |