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Inventor

SOUMENDRA BARMAN

Inventor
US

Overview

4→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G01BMeasuring length, thickness or similar linear dimensions17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
H01JElectric discharge tubes or discharge lamps17%
H01LSemiconductor devices17%
PatentTitleYear
12,489,022In-situ etch rate and etch rate uniformity detection system202511,927,543Multiple reflectometry for measuring etch parameters202411,830,779In-situ etch material selectivity detection system202311,619,594Multiple reflectometry for measuring etch parameters2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2023–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC42023–2025
Locations
LocationPatentsSpan
US42023–2025