Inventor
Jan Frans Van Besauw
Inventor
Mortsel, BE
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Cprimary
G03CPhotosensitive materials for photographic purposes27%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
C07CAcyclic or carbocyclic compounds9%
C07DHeterocyclic compounds9%
G03GElectrography9%
PatentTitleYear
4,420,553'Photosensitive recording material and photographic processes wherein said material is used'19834,013,473'Recording materials and image receiving materials for producing copies in a dry way'19774,004,925'Production of photomasks by forming complex of silver and diazonium or pyrylium salts'19773,989,522'Manufacture of a planographic printing plate by making silver halide areas of emulsion oleophicic'19763,964,903'Development of electrostatic images'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1983Patents assigned to AGFA GEVAERT NV (5)· patent assignee history
1976–1983Based in Mortsel, BE· patent location history
1976Based in Brasschaat, BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGFA GEVAERT NV | 5 | 1976–1983 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mortsel, BE | 4 | 1976–1983 |
| Brasschaat, BE | 1 | 1976 |