Inventor
Yoshihumi Takeda
Inventor
Niigata, JP
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds21%
C04BLime, magnesia19%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C08LCompositions of macromolecular compounds5%
C07CAcyclic or carbocyclic compounds3%
B05DProcesses for applying fluent materials to surfaces, in general1%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium1%
PatentTitleYear
11,016,416Image forming apparatus and developer container20216,335,141'Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group'20026,312,869'Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group'20016,114,462'Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group'20006,022,665'Polymers and chemically amplified positive resist compositions'20005,942,367'Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group'19995,844,057'Polymers and chemically amplified positive resist compositions'19985,772,925'Anti-reflective coating composition'19985,759,739'Resist composition with polymeric dissolution inhibitor and alkali soluble resin'19985,691,112'Sulfonium salt and chemically amplified positive resist composition'19975,633,409'Tristertbutoxyphenyl sulfonium tosylate compound'19975,580,936'Method for preparing partially tert-butoxylated poly(p-hydroxystyrene)'19965,529,888'Water-soluble film forming composition'19965,393,815'Silazane-based, heat resistant, dielectric coating compositions'19955,352,564'Resist compositions'19945,296,418'Method for manufacturing a hafnium-containing silazane polymer and a method for manufacturing a ceramic from said polymer'19945,254,411'Formation of heat-resistant dielectric coatings'19935,210,058'Method for preparing organic silazane polymers and method for preparing ceramics from the polymers'19935,200,371'Method for preparing organic silazane polymers and method for preparing ceramics from the polymers'19935,183,875'Method for manufacturing a hafnium-containing silazane polymer and a method for manufacturing a ceramic from said polymer'19935,157,096'Method and apparatus for preparing organic silazane polymer and method for preparing inorganic fibers'19925,075,474'Method for preparing hexamethyl cyclotrisilazane'19915,041,515'Methods for preparing polytitanocarbosilazane polymers and ceramics therefrom'19915,008,348'Infusibilization of organic silazane polymers'19914,948,763'Preparation of hollow ceramic fibers'19904,870,035'Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers'19894,869,854'Process for manufacturing organic silazane polymers and ceramics therefrom'19894,847,345'Process for manufacturing organic silazane polymers and ceramics therefrom'19894,771,118'Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers'19884,657,991'Precursor composition of silicon carbide'19874,604,367'Method for the preparation of an inorganic fiber containing silicon, carbon, boron and nitrogen'19864,550,151'Organoborosilicon polymer and a method for the preparation thereof'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1985–2002Patents assigned to SHINETSU CHEMICAL CO (31)· patent assignee history
1985–1997Based in Niigata, JP· patent location history
1989–1998Based in Joetsu-shi, JP· patent location history
1991–1995Based in Jouetsu, JP· patent location history
1992Patents assigned to FOUNDATION RES INST (1)· patent assignee history
1996–2002Based in Nishikamo-gun, JP· patent location history
2021Patents assigned to TOSHIBA TEC KK (1)· patent assignee history
2021Based in Shizuoka-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 31 | 1985–2002 |
| FOUNDATION RES INST | 1 | 1992 |
| TOSHIBA TEC KK | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Niigata, JP | 11 | 1985–1997 |
| Nishikamo-gun, JP | 10 | 1996–2002 |
| Joetsu-shi, JP | 6 | 1989–1998 |
| Jouetsu, JP | 4 | 1991–1995 |
| Shizuoka-shi, JP | 1 | 2021 |