Inventor
Yoshitomo Nagahashi
Inventor
Takasaki, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices87%
B01DSeparation7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
PatentTitleYear
9,829,807Exposure apparatus, exposure method, method for manufacturing device20179,581,913'Exposure apparatus, exposure method, method for manufacturing device'20178,896,813'Exposure apparatus, exposure method, method for manufacturing device'20148,797,502'Exposure apparatus, exposure method, and method for producing device with electricity removal device by adding additive to liquid'20147,973,906'Exposure apparatus, exposure method, method for manufacturing device'20117,948,608'Exposure apparatus, exposure method, method for manufacturing device'20117,643,129'Exposure apparatus, exposure method, method for manufacturing device'20107,416,574'Filter apparatus, exposure apparatus, and device-producing method'20087,116,396'Exposure device, exposure method and device manufacturing method'20067,106,414'Exposure system and method for manufacturing device'20066,922,910'Exposure apparatus'20056,784,972'Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus'20046,753,942'Environmental control chamber'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2017Patents assigned to NIKON CORP (11)· patent assignee history
2004Based in Chiyoda-ku, JP· patent location history
2004Based in Gunma, JP· patent location history
2005–2017Based in Takasaki, JP· patent location history
2006Patents assigned to SENDAI NIKON CORP (1)· patent assignee history
2014Patents assigned to NAGAHASHI YOSHITOMO (2)· patent assignee history
2017Patents assigned to NIPPON KOGAKU KK (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 11 | 2004–2017 |
| NAGAHASHI YOSHITOMOself | 2 | 2014 |
| NIPPON KOGAKU KK | 1 | 2017 |
| SENDAI NIKON CORP | 1 | 2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Takasaki, JP | 11 | 2005–2017 |
| Chiyoda-ku, JP | 1 | 2004 |
| Gunma, JP | 1 | 2004 |