Inventor

Takao Miura

Inventor

Yokkaichi, JP

Overview

32→

Patents

1976–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

H10DInorganic electric semiconductor devices5%

B05BSpraying apparatus3%

B08BCleaning in general3%

B21CManufacture of metal sheets, wire, rods, tubes, profiles or like semi-manufactured products otherwise than by rolling3%

B23KSoldering or unsoldering3%

PatentTitleYear

10,937,733Semiconductor device2021 9,446,473'Electric resistance welding operation management device, electric resistance welding operation management method, and computer program'2016 9,416,882'Split valve'2016 9,327,908'Conveying apparatus'2016 9,199,291'Operation management device, operation management method, and operation management program for high-frequency resistance welding and induction welding'2015 5,753,406'Radiation-sensitive resin composition'1998 5,705,425'Process for manufacturing semiconductor devices separated by an air-bridge'1998 5,609,988'Radiation sensitive resin composition'1997 5,594,724'Transmission convergence sublayer multiplex generating/terminating apparatus'1997 5,580,695'Chemically amplified resist'1996 5,525,457'Reflection preventing film and process for forming resist pattern using the same'1996 5,494,777'Radiation sensitive resin composition'1996 5,482,816'Radiation-sensitive composition'1996 5,482,063'Tank cleaning device'1996 5,478,691'Radiation-sensitive resin composition'1995 5,413,896'I-ray sensitive positive resist composition'1995 5,410,005'Reflection preventing film and process for forming resist pattern using the same'1995 5,376,498'Negative type radiation-sensitive resin composition'1994 5,332,650'Radiation-sensitive composition'1994 5,250,836'Semiconductor device having silicon-on-insulator structure'1993 5,238,775'Radiation-sensitive resin composition'1993 5,233,218'Semiconductor wafer and process for producing same'1993 5,231,045'Method of producing semiconductor-on-insulator structure by besol process with charged insulating layers'1993 5,148,247'Semiconductor device having trench isolation'1992 5,110,706'I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive'1992 5,066,993'Semiconductor device having semiconductor-on-insulator structure'1991 5,019,479'Positive type radiation-sensitive resin composition comprising a photosensitizer and a novolak resin'1991 5,017,998'Semiconductor device using SOI substrate'1991 4,755,479'Manufacturing method of insulated gate field effect transistor using reflowable sidewall spacers'1988 4,496,102'Cleaning apparatus'1985 4,132,666'Process for preparing alkali metal dispersions'1979 3,948,667'Photosensitive compositions'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1998Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (16)· patent assignee history

1988–1998Patents assigned to FUJITSU LTD (8)· patent assignee history

1988–2021Based in Tokyo, JP· patent location history

1991–1998Based in Yokkaichi, JP· patent location history

1993–1998Based in Kawasaki, JP· patent location history

1996Based in Kawaguchi, JP· patent location history

2015–2016Patents assigned to NIPPON STEEL & SUMITOMO METAL CORP (2)· patent assignee history

2015Patents assigned to HAMATANI HIDEKI (1)· patent assignee history

2016Patents assigned to MIURA KOGYO KK (2)· patent assignee history

2016Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
JAPAN SYNTHETIC RUBBER CO LTD	16	1976–1998
FUJITSU LTD	8	1988–1998
MIURA KOGYO KK	2	2016
NIPPON STEEL & SUMITOMO METAL CORP	2	2015–2016
HAMATANI HIDEKI	1	2015

Locations

Location	Patents	Span
Yokkaichi, JP	14	1991–1998
Tokyo, JP	10	1988–2021
Saitama, JP	2	2016
Kawasaki, JP	2	1993–1998
Kawaguchi, JP	1	1996