Inventor
Dale K. Stone
Inventor
Lynnfield, MA, US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
H01LSemiconductor devices15%
H01JElectric discharge tubes or discharge lamps12%
H02NElectric machines not otherwise provided for11%
C23CCoating metallic material5%
H10DInorganic electric semiconductor devices5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B05DProcesses for applying fluent materials to surfaces, in general2%
C04BLime, magnesia2%
PatentTitleYear
10,658,207Platen for reducing particle contamination on a substrate and a method thereof202010,541,137Method and apparatus for non line-of-sight doping202010,385,454Diffusion resistant electrostatic clamp201910,157,764Thermal shield for electrostatic chuck20189,953,849Platen for reducing particle contamination on a substrate and a method thereof20189,692,325'High conductivity electrostatic chuck'20179,644,269'Diffusion resistant electrostatic clamp'20179,633,875'Apparatus for improving temperature uniformity of a workpiece'20179,082,804'Triboelectric charge controlled electrostatic clamp'20159,025,305'High surface resistivity electrostatic chuck'20158,681,472'Platen ground pin for connecting substrate to ground'20148,672,311'Method of cooling textured workpieces with an electrostatic chuck'20148,598,021'Method for junction avoidance on edge of workpieces'20138,531,814'Removal of charge between a substrate and an electrostatic clamp'20137,751,172'Sliding wafer release gripper/wafer peeling gripper'20107,715,170'Electrostatic chuck with separated electrodes'20107,381,969'Load lock control'20087,205,556'Bellows liner for an ion beam implanter'20077,173,260'Removing byproducts of physical and chemical reactions in an ion implanter'20077,151,658'High-performance electrostatic clamp comprising a resistive layer, micro-grooves, and dielectric layer'20066,583,428'Apparatus for the backside gas cooling of a wafer in a batch ion implantation system'20035,670,217'Method for capturing and removing contaminant particles from an interior region of an ion implanter'19975,656,092'Apparatus for capturing and removing contaminant particles from an interior region of an ion implanter'19975,436,790'Wafer sensing and clamping monitor'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–1997Based in Haverhill, MA, US· patent location history
2003–2010Patents assigned to AXCELIS TECH INC (6)· patent assignee history
2003–2020Based in Lynnfield, MA, US· patent location history
2010–2015Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT (7)· patent assignee history
2013–2017Patents assigned to STONE DALE K (6)· patent assignee history
2013–2017Patents assigned to BLAKE JULIAN (4)· patent assignee history
2017–2020Patents assigned to VARIAN SEMICONDUCTOR EQUIPMENT ASS INC (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| VARIAN SEMICONDUCTOR EQUIPMENT ASS INC | 8 | 2017–2020 |
| VARIAN SEMICONDUCTOR EQUIPMENT | 7 | 2010–2015 |
| AXCELIS TECH INC | 6 | 2003–2010 |
| STONE DALE Kself | 6 | 2013–2017 |
| BLAKE JULIAN | 4 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Lynnfield, Massachusetts, US | 21 | 2003–2020 |
| Haverhill, Massachusetts, US | 3 | 1995–1997 |