Inventor
Liran YERUSHALMI
Inventor
IL
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices16%
G01BMeasuring length, thickness or similar linear dimensions14%
G05BControl or regulating systems in general8%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
G06FElectric digital data processing2%
G06TImage data processing or generation, in general2%
PatentTitleYear
12,393,113Inter-step feedforward process control in the manufacture of semiconductor devices202512,347,706Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein202512,131,959Systems and methods for improved metrology for semiconductor device wafers202411,971,664Reducing device overlay errors202411,880,142Self-calibrating overlay metrology202411,784,097Measurement of overlay error using device inspection system202311,709,433Device-like metrology targets202311,644,419Measurement of properties of patterned photoresist202311,635,682Systems and methods for feedforward process control in the manufacture of semiconductor devices202311,604,420Self-calibrating overlay metrology202311,604,063Self-calibrated overlay metrology using a skew training sample202311,532,566Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices202211,355,375Device-like overlay metrology targets displaying Moire effects202211,353,799System and method for error reduction for metrology measurements202211,302,544Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to KLA CORP (10)· patent assignee history
2022–2025Patents assigned to KLA TENCOR CORP (5)· patent assignee history
2022–2025Based in IL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA CORP | 10 | 2022–2025 |
| KLA TENCOR CORP | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| IL | 15 | 2022–2025 |