Inventor
Hiroshi Sunagawa
Inventor
Kanagawa, JP
Overview
Patents· 46 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus15%
H04NPictorial communication, e.g. television14%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
G11BInformation storage based on relative movement between record carrier and transducer10%
B41JTypewriters9%
G06KGraphical data reading8%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
G03GElectrography5%
A61BDiagnosis4%
PatentTitleYear
8,790,253'Light source device, imaging apparatus and endoscope apparatus'20148,593,513'Image capturing apparatus having first and second light reception sections, image capturing method, and computer-readable medium'20138,202,365'Process for producing oriented inorganic crystalline film, and semiconductor device using the oriented inorganic crystalline film'20127,787,121'Imaging apparatus'20107,700,265'Image forming method, planographic printing plate precursor, and planographic printing method'20107,471,309'Image exposing apparatus and image exposing method'20087,212,225'Enhanced resolution image recording method and enhanced resolution image recording apparatus'20077,126,624'Image recording method and image recording apparatus'20067,068,414'Exposure head and exposure apparatus'20066,953,268'Light modulating device and exposure apparatus using the same'20056,552,777'Image exposing method and image exposing apparatus'20036,519,387'Image recording device and optical fiber'20036,466,359'Multi-beam exposure apparatus'20026,208,371'Laser beam image recording apparatus'20016,124,876'Image-wise exposure apparatus, mirror array device, and liquid crystal panel'20005,995,129'Image-wise exposure apparatus'19995,990,921'Image-wise exposure apparatus, mirror array device, and liquid crystal panel'19995,912,757'Image-wise exposure apparatus'19995,757,410'Image-wise exposure apparatus and image displaying apparatus'19985,754,286'Method of identifying defective picture element in image-wise exposure apparatus'19985,748,283'Light-source device for exposure and light-source device for image reading'19985,663,782'Photographic printer and film scanner having an LED light source'19975,436,991'Optical waveguide device'19955,315,676'Optical waveguide device'19945,153,860'Optical pickup apparatus for detecting and correcting focusing and tracking errors in detected recorded signals'19925,138,482'Light modular and recording device employing same'19925,101,459'Optical waveguide grating coupler device'19925,083,856'Waveguide-type acoustooptic device'19925,081,615'Method of coupling external light into an optical waveguide and a guided wave from an optical waveguide and optical pickup employing an optical waveguide'19924,991,931'Method of driving optical wavelength converter module'19914,945,527'Optical pickup apparatus for detection of focusing error, tracking error, and information'19904,922,103'Radiation image read-out apparatus'19904,885,732'Optical pickup apparatus for detecting and correcting focusing and tracking errors in detected recorded signals'19894,868,803'Magneto-optic pickup head including tracking and focusing error correction'19894,833,561'Pickup apparatus for magneto-optical recording medium'19894,830,448'Light modulator and wave guide device'19894,816,679'Radiation image read-out apparatus'19894,797,867'Pick-up head for optical information storage disk'19894,758,062'Light beam scanning apparatus, and read-out apparatus and recording apparatus using same'19884,755,415'Optical shutter array and method for making'19884,738,501'Light beam scanning apparatus, and read-out apparatus and recording apparatus using same'19884,631,407'Radiation image information read-out system'19864,582,769'Electrophotographic element with amorphous Si(C) overlayer'19864,559,289'Electrophotographic light-sensitive material'19854,555,464'Amorphous silicon electrophotographic photosensitive materials'19854,430,405'Xeroradiographic material and method of making same'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–2006Patents assigned to FUJI PHOTO FILM CO LTD (39)· patent assignee history
1985–2014Based in Kanagawa, JP· patent location history
1986–1988Based in Kaisei-machi, JP· patent location history
1988Based in Minami-ashigara, JP· patent location history
2001Based in Odawara, JP· patent location history
2007–2014Patents assigned to FUJIFILM CORP (7)· patent assignee history
2010Patents assigned to FUJINON CORP (1)· patent assignee history
2010Based in Ashigarakami-gun, JP· patent location history
2012–2014Patents assigned to SUNAGAWA HIROSHI (3)· patent assignee history
2013–2014Patents assigned to MIZUYOSHI AKIRA (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI PHOTO FILM CO LTD | 39 | 1984–2006 |
| FUJIFILM CORP | 7 | 2007–2014 |
| SUNAGAWA HIROSHIself | 3 | 2012–2014 |
| MIZUYOSHI AKIRA | 2 | 2013–2014 |
| FUJINON CORP | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 39 | 1985–2014 |
| Kaisei-machi, JP | 3 | 1986–1988 |
| Ashigarakami-gun, JP | 1 | 2010 |
| Odawara, JP | 1 | 2001 |
| Minami-ashigara, JP | 1 | 1988 |