Inventor
Jianhua Zhou
Inventor
Campbell, CA, US
Overview
Patents· 64 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H01JElectric discharge tubes or discharge lamps13%
H01LSemiconductor devices13%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
G06FElectric digital data processing4%
G01BMeasuring length, thickness or similar linear dimensions3%
Y10TTechnical subjects covered by former us classification2%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems2%
H05HPlasma technique2%
PatentTitleYear
10,879,041Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers202010,829,244LED lighting devices with high extraction efficiencies202010,811,301Dual-zone heater for plasma processing202010,793,954PECVD process202010,720,349Temperature measurement in multi-zone heater202010,711,350Alumina layer formation on aluminum surface to protect aluminum parts202010,697,062Gas flow guide design for uniform flow distribution and efficient purge202010,694,138OLED drive power device and OLED television202010,692,703Ceramic heater with enhanced RF power delivery202010,636,684Loadlock integrated bevel etcher system202010,599,043Critical methodology in vacuum chambers to determine gap and leveling between wafer and hardware components202010,552,315Data processing method and apparatus, and flash device202010,544,508Controlling temperature in substrate processing systems202010,497,606Dual-zone heater for plasma processing201910,480,074Apparatus for radical-based deposition of dielectric films201910,480,077PEALD apparatus to enable rapid cycling201910,450,653High impedance RF filter for heater with impedance tuning device201910,403,515Loadlock integrated bevel etcher system201910,403,535Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system201910,385,448Apparatus and method for purging gaseous compounds201910,325,799Dual temperature heater201910,310,930Solid state disk using method and apparatus201910,266,943Plasma corrosion resistive heater for high temperature processing201910,261,906Data accessing method and apparatus201910,161,035Apparatus and method for purging gaseous compounds201810,153,185Substrate temperature measurement in multi-zone heater201810,125,422High impedance RF filter for heater with impedance tuning device201810,127,099Bad sector repair method and apparatus201810,128,118Bottom and side plasma tuning having closed loop control201810,090,187Multi-zone pedestal for plasma processing201810,060,032PECVD process201810,030,306PECVD apparatus and process20189,975,320Diffusion bonded plasma resisted chemical vapor deposition (CVD) chamber heater20189,840,777'Apparatus for radical-based deposition of dielectric films'20179,816,187'PECVD process'20179,725,806'Multi-zone pedestal for plasma processing'20179,556,507'Yttria-based material coated chemical vapor deposition chamber heater'20179,537,412'Direct current voltage conversion device and clamping circuit'20179,473,035'Power conversion device'20169,458,537'PECVD process'20169,450,886'Bandwidth adjustment method, bus controller, and signal convertor'20169,391,862'Method and apparatus for scheduling a service processing resource'20169,384,950'Chamber coatings'20169,157,730'PECVD process'20158,911,553'Quartz showerhead for nanocure UV chamber'20148,884,524'Apparatus and methods for improving reliability of RF grounding'20148,778,813'Confined process volume PECVD chamber'20148,772,682'Methods and apparatus for controlling temperature of a multi-zone heater in a process chamber'20148,666,255'Circuits, architectures, apparatuses, systems, and methods for merging of management and data signals, and for recovery of a management signal'20148,629,029'Vertical SOI bipolar junction transistor and manufacturing method thereof'20148,552,346'Methods and apparatus for controlling temperature of a multi-zone heater in an process chamber'20138,525,417'Discharge electrode array for thin-film solar cell deposition'20138,438,989'Surface feed-in electrodes for deposition of thin film solar cell and signal feed-in method thereof'20138,291,858'Movable jig for silicon-based thin film solar cell'20128,282,734'Methods to improve the in-film defectivity of PECVD amorphous carbon films'20128,274,017'Multifunctional heater/chiller pedestal for wide range wafer temperature control'20128,197,636'Systems for plasma enhanced chemical vapor deposition and bevel edge etching'20128,097,082'Nonplanar faceplate for a plasma processing chamber'20127,904,732'Encrypting and decrypting database records'20117,514,125'Methods to improve the in-film defectivity of PECVD amorphous carbon films'20097,395,737'Bottle opener'20086,797,511'Alarm related peptides and nucleic acids and diagnosis using them'20046,258,929'Alarm related peptides and nucleic acids and diagnosis using them'20015,877,414'Vehicle road load simulation using effective road profile'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2014Patents assigned to ZHOU JIANHUA (14)· patent assignee history
2009–2020Patents assigned to APPLIED MATERIALS INC (44)· patent assignee history
2009–2014Based in San Jose, CA, US· patent location history
2012–2014Patents assigned to NOWAK THOMAS (4)· patent assignee history
2012–2014Patents assigned to ROCHA-ALVAREZ JUAN CARLOS (4)· patent assignee history
2012–2020Based in Shenzhen, CN· patent location history
2014–2020Based in Campbell, CA, US· patent location history
2014–2020Based in Chengdu, CN· patent location history
2014–2020Based in Shanghai, CN· patent location history
2016–2020Patents assigned to HUAWEI TECH CO LTD (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 44 | 2009–2020 |
| ZHOU JIANHUAself | 14 | 2008–2014 |
| HUAWEI TECH CO LTD | 6 | 2016–2020 |
| NOWAK THOMAS | 4 | 2012–2014 |
| ROCHA-ALVAREZ JUAN CARLOS | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Campbell, California, US | 36 | 2014–2020 |
| San Jose, California, US | 8 | 2009–2014 |
| Shenzhen, CN | 6 | 2012–2020 |
| Chengdu, CN | 5 | 2014–2020 |
| Shanghai, CN | 2 | 2014–2020 |