Inventor

Masataka Hasegawa

Inventor
Tsukuba, JP

Overview

11→
Patents
2004–2016
Patent span
Chemistry
Primary field (CPC C)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material14%
Y10TTechnical subjects covered by former us classification14%
B24DTools for grinding, buffing or sharpening8%
B82YSpecific uses or applications of nanostructures5%
C01BNon-metallic elements5%
C03CChemical composition of glasses, glazes or vitreous enamels5%
G02BOptical elements, systems or apparatus5%
H10DInorganic electric semiconductor devices5%
H10HInorganic light-emitting semiconductor devices having potential barriers5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2015Based in Tsukuba, JP· patent location history
2009Based in Takasago, JP· patent location history
2011–2015Patents assigned to NAT INST OF ADVANCED IND SCIEN (5)· patent assignee history
2011–2014Based in Ibaraki, JP· patent location history
2013–2015Patents assigned to HASEGAWA MASATAKA (3)· patent assignee history
2013–2015Patents assigned to ISHIHARA MASATOU (3)· patent assignee history
2013–2015Patents assigned to KOGA YOSHINORI (3)· patent assignee history
2013–2015Patents assigned to TSUGAWA KAZUO (3)· patent assignee history
2015Based in Kanagawa, JP· patent location history
2016Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAT INST OF ADVANCED IND SCIEN52011–2015
HASEGAWA MASATAKAself32013–2015
ISHIHARA MASATOU32013–2015
KOGA YOSHINORI32013–2015
TSUGAWA KAZUO32013–2015
Locations
LocationPatentsSpan
Tsukuba, JP32004–2015
Ibaraki, JP32011–2014
Tokyo, JP12016
Kanagawa, JP12015
Takasago, JP12009