Inventor
DAVID J. TOWNER
Inventor
US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices40%
B82YSpecific uses or applications of nanostructures20%
H01LSemiconductor devices20%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
PatentTitleYear
12,563,782Fabrication of gate-all-around integrated circuit structures having common metal gates and having gate dielectrics with differentiated dipole layers202612,310,060Gate-all-around integrated circuit structures having uniform threshold voltages and tight gate endcap tolerances202512,119,344Multi-layer etch stop layers for advanced integrated circuit structure fabrication202412,107,040Metal insulator metal (MIM) capacitor2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to INTEL CORP (4)· patent assignee history
2024–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INTEL CORP | 4 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 4 | 2024–2026 |