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Inventor

Bert VERSTRAETEN

Inventor
BE

Overview

3→
Patents
2022–2024
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
G01BMeasuring length, thickness or similar linear dimensions20%
G01MTesting static or dynamic balance of machines or structures20%
PatentTitleYear
12,007,697Method for process metrology202411,506,566Method of processing data, method of obtaining calibration data202211,385,551Method for process metrology2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2024Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2022–2024Based in BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32022–2024
Locations
LocationPatentsSpan
BE32022–2024