Inventor
Thaddeus Gerard Dziura
Inventor
San Jose, CA, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G01BMeasuring length, thickness or similar linear dimensions16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H01LSemiconductor devices9%
G06FElectric digital data processing6%
G06TImage data processing or generation, in general4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering2%
H10BElectronic memory devices2%
PatentTitleYear
11,099,137Visualization of three-dimensional semiconductor structures202110,794,839Visualization of three-dimensional semiconductor structures202010,775,323Full beam metrology for X-ray scatterometry systems202010,727,142Process monitoring of deep structures with X-ray scatterometry202010,612,916Measurement of multiple patterning parameters202010,502,694Methods and apparatus for patterned wafer characterization201910,352,695X-ray scatterometry metrology for high aspect ratio structures201910,325,004Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology201910,255,385Model optimization approach based on spectral sensitivity201910,151,986Signal response metrology based on measurements of proxy structures201810,152,678System, method and computer program product for combining raw data from multiple metrology tools20189,816,810'Measurement of multiple patterning parameters'20179,778,213'Metrology tool with combined XRF and SAXS capabilities'20179,535,018'Combined x-ray and optical metrology'20179,490,182'Measurement of multiple patterning parameters'20169,435,735'Optical parametric model optimization'20169,311,431'Secondary target design for optical measurements'20169,310,296'Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology'20169,255,877'Metrology system optimization for parameter tracking'20168,879,073'Optical metrology using targets with field enhancement elements'20148,860,937'Metrology systems and methods for high aspect ratio and large lateral dimension structures'20148,666,703'Method for automated determination of an optimally parameterized scatterometry model'20148,090,558'Optical parametric model optimization'20127,933,016'Apparatus and methods for detecting overlay errors using scatterometry'20117,663,753'Apparatus and methods for detecting overlay errors using scatterometry'20107,656,512'Method for determining lithographic focus and exposure'20107,382,447'Method for determining lithographic focus and exposure'20087,317,531'Apparatus and methods for detecting overlay errors using scatterometry'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2011Patents assigned to KLA TENCOR TECH CORP (5)· patent assignee history
2008–2021Based in San Jose, CA, US· patent location history
2012–2020Patents assigned to KLA TENCOR CORP (22)· patent assignee history
2012–2019Patents assigned to DZIURA THADDEUS G (3)· patent assignee history
2014–2019Patents assigned to HENCH JOHN J (3)· patent assignee history
2016–2019Patents assigned to DZIURA THADDEUS GERARD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 22 | 2012–2020 |
| KLA TENCOR TECH CORP | 5 | 2008–2011 |
| DZIURA THADDEUS Gself | 3 | 2012–2019 |
| HENCH JOHN J | 3 | 2014–2019 |
| DZIURA THADDEUS GERARDself | 2 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 28 | 2008–2021 |