Inventor
OSAMU WAKABAYASHI
Inventor
JP
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
B23KSoldering or unsoldering8%
G02BOptical elements, systems or apparatus8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H01LSemiconductor devices5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
H05GX-ray technique3%
G05BControl or regulating systems in general2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
PatentTitleYear
12,573,817Exposure system, exposure method, and electronic device manufacturing method202612,513,808Extreme ultraviolet light generation apparatus and electronic device manufacturing method202512,438,333Line narrowing gas laser device, wavelength control method, and electronic device manufacturing method202512,406,889Electronic device manufacturing method202512,389,508Light source parameter information management method, light source parameter information management apparatus, and computer readable medium202512,300,962Laser device and electronic device manufacturing method202512,237,640Line narrowing device and electronic device manufacturing method202512,216,409Exposure system, laser control parameter production method, and electronic device manufacturing method202512,197,132Exposure system and method for manufacturing electronic devices202512,160,085Laser system and electronic device manufacturing method202412,111,577Line narrowing device, electronic device manufacturing method202412,105,425Exposure method, exposure system, and method for manufacturing electronic devices202412,076,815Laser processing apparatus and method for processing workpiece202412,072,507Laser radiation system202412,038,567Pulse width expansion apparatus and electronic device manufacturing method202411,826,852Laser processing apparatus, laser processing system, and laser processing method202311,822,324Machine learning method, consumable management apparatus, and computer readable medium202311,804,697Laser system and electronic device manufacturing method202311,768,362Laser radiation system and method for manufacturing electronic device202311,764,541Laser system and method for manufacturing electronic device202311,710,660Laser irradiation method and laser irradiation system202311,614,572Mirror for extreme ultraviolet light and extreme ultraviolet light generating apparatus202311,604,416Laser processing method and laser processing system202311,502,478Laser apparatus, laser apparatus management system, and laser apparatus management method202211,477,877Laser apparatus for generating extreme ultraviolet light202211,469,568Laser apparatus and laser processing system202211,465,233Laser processing system and laser processing method202211,451,003Laser gas regenerating apparatus and electronic device manufacturing method202211,353,801Maintenance management method for lithography system, maintenance management apparatus, and computer readable medium202211,353,857Data analyzer, semiconductor manufacturing system, data analysis method, and semiconductor manufacturing method202211,271,360Wavelength converter202211,264,773Laser apparatus and method for manufacturing optical element202211,217,962Laser system202211,194,255Laser processing method and laser processing system202111,162,530Gas laser apparatus and magnetic bearing control method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to GIGAPHOTON INC (35)· patent assignee history
2021–2026Based in JP· patent location history
2023–2024Patents assigned to UNIV KYUSHU NAT UNIV CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| GIGAPHOTON INC | 35 | 2021–2026 |
| UNIV KYUSHU NAT UNIV CORP | 2 | 2023–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 35 | 2021–2026 |