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Inventor

Hideo Fukutani

Inventor
Tokyo, JP

Overview

3→
Patents
1977–1978
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests29%
C07CAcyclic or carbocyclic compounds14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
G03CPhotosensitive materials for photographic purposes14%
PatentTitleYear
4,083,725'Photosensitive composition'19784,063,953'Photosensitive composition'19774,042,391'Process for forming vesicular photographic images by employing simultaneous actinic light and infra-red reflex exposure'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977–1978Patents assigned to MITSUBISHI CHEM IND (3)· patent assignee history
1977–1978Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI CHEM IND31977–1978
Locations
LocationPatentsSpan
Tokyo, JP31977–1978