Inventor

Hirotaka Oosuka

Inventor

Tokyo, JP

Overview

2011

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation20%

C02FTreatment of water, waste water, sewage, or sludge20%

D06FLaundering, drying, ironing, pressing or folding textile articles20%

E03DWater-closets or urinals with flushing devices20%

H04BTransmission20%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to SONY CORP (1)· patent assignee history

2011Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SONY CORP	1	2011

Locations

Location	Patents	Span
Tokyo, JP	1	2011