Inventor
Young Hoon Song
Inventor
Daejeon, KR
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B01Dprimary
B01DSeparation14%
H01GCapacitors14%
H05HPlasma technique11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general6%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
H01JElectric discharge tubes or discharge lamps6%
Y10TTechnical subjects covered by former us classification6%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%
PatentTitleYear
10,777,358Capacitor component202010,032,864Semiconductor device having field insulation layer between two fins20189,689,878'Assay method using encoded particle-based platform'20179,267,950'Assay method using encoded particle-based platform'20168,908,352'Chip type laminated capacitor'20148,852,520'Plasma reactor for abating hazardous materials and driving method thereof'20148,804,304'Chip type laminated capacitor'20148,673,986'Coacervate having an ionic polymer mixed with the adhesive protein of a mussel or of a species of the variome thereof'20148,574,504'Plasma scrubber'20138,568,662'Plasma reaction apparatus, plasma reaction method using the same, plasma reaction method of persistent gas, and apparatus for decreasing NOx by occlusion catalyst'20138,524,162'Plasma reaction, apparatus for decreasing NOx by occlusion catalyst using the same'20138,385,048'Chip type laminated capacitor'20138,351,181'Chip type laminated capacitor'20138,272,206'Apparatus for plasma reaction and system for reduction of particulate materials in exhaust gas using the same'20128,257,455'Plasma burner and diesel particulate filter trap'20127,998,357'Method of fine patterning semiconductor device'20116,395,144'Method for treating toxic compounds-containing gas by non-thermal plasma'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2014Patents assigned to KOREA MACH & MATERIALS INST (7)· patent assignee history
2011–2017Based in Seoul, KR· patent location history
2012–2014Patents assigned to CHA MIN-SUK (4)· patent assignee history
2012–2014Patents assigned to KIM KWAN-TAE (4)· patent assignee history
2012–2014Based in Daejeon, KR· patent location history
2013–2020Patents assigned to SAMSUNG ELECTRO MECH (5)· patent assignee history
2013–2014Patents assigned to SONG YOUNG HOON (5)· patent assignee history
2013–2014Based in Kyungki-do, KR· patent location history
2014Based in Pohang-si, KR· patent location history
2018–2020Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOREA MACH & MATERIALS INST | 7 | 2002–2014 |
| SAMSUNG ELECTRO MECH | 5 | 2013–2020 |
| SONG YOUNG HOONself | 5 | 2013–2014 |
| CHA MIN-SUK | 4 | 2012–2014 |
| KIM KWAN-TAE | 4 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 5 | 2012–2014 |
| Kyungki-do, KR | 4 | 2013–2014 |
| Seoul, KR | 3 | 2011–2017 |
| Suwon-si, KR | 2 | 2018–2020 |
| Pohang-si, KR | 1 | 2014 |