LexDanaLexDanabeta
Inventor

YanLei Zu

Inventor
Shanghai, CN

Overview

2→
Patents
2015–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01JElectric discharge tubes or discharge lamps20%
H01LSemiconductor devices20%
H10DInorganic electric semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
9,298,099'Exposure apparatus and exposure method thereof'20169,019,152'Standard wafer and its fabrication method'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to CAI BOXIU (1)· patent assignee history
2015Patents assigned to SEMICONDUCTOR MFG INT CORP (1)· patent assignee history
2015Patents assigned to ZU YANLEI (1)· patent assignee history
2015–2016Based in Shanghai, CN· patent location history
2016Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CAI BOXIU12015
SEMICONDUCTOR MFG INT CORP12015
SEMICONDUCTOR MFG INT SHANGHAI12016
ZU YANLEIself12015
Locations
LocationPatentsSpan
Shanghai, CN22015–2016