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Inventor

Shingo Maku

Inventor
Tokyo, JP

Overview

3→
Patents
2006–2009
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C03CChemical composition of glasses, glazes or vitreous enamels14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
7,509,962'Method and control system for treating a hafnium-based dielectric processing system'20097,125,812'CVD method and device for forming silicon-containing insulation film'20067,094,708'Method of CVD for forming silicon nitride film on substrate'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2009Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2006Based in Tokyo, JP· patent location history
2009Based in Kai, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32006–2009
Locations
LocationPatentsSpan
Tokyo, JP22006
Kai, JP12009